Applied Materials Patent Grants

Chamber components with polished internal apertures

Granted: June 27, 2017
Patent Number: 9687953
Disclosed herein are systems and methods for polishing internal surfaces of apertures in semiconductor processing chamber components. A method includes providing a ceramic article having at least one aperture, the ceramic article being a component for a semiconductor processing chamber. The method further includes polishing the at least one aperture based on flowing an abrasive media through the at least one aperture of the ceramic article, the abrasive media including a polymer base and…

Polishing pad cleaning systems employing fluid outlets oriented to direct fluid under spray bodies and towards inlet ports, and related methods

Granted: June 27, 2017
Patent Number: 9687960
Polishing pad cleaning systems employing fluid outlets orientated to direct fluid under spray bodies and towards inlet ports, and related methods are disclosed. A polishing pad in combination with slurry contacts a substrate to planarize a surface of the substrate and remove substrate defects while creating debris. A spray system removes the debris from the polishing pad to prevent substrate damage and improve efficiency. By directing fluid under a spray body to the polishing pad and…

Deposition ring and electrostatic chuck for physical vapor deposition chamber

Granted: June 27, 2017
Patent Number: 9689070
Embodiments of the invention generally relate to a process kit for a semiconductor processing chamber, and a semiconductor processing chamber having a kit. More specifically, embodiments described herein relate to a process kit including a deposition ring and a pedestal assembly. The components of the process kit work alone, and in combination, to significantly reduce their effects on the electric fields around a substrate during processing.

Electroplating wafers having a notch

Granted: June 27, 2017
Patent Number: 9689082
An electroplating apparatus has a vessel for holding electrolyte. A head has a rotor including a contact ring for holding a wafer having a notch. The contact ring includes a perimeter voltage ring having perimeter contact fingers for contacting the wafer around the perimeter of the wafer, except at the notch. The contact ring also has a notch contact segment having one or more notch contact fingers for contacting the wafer at the notch. The perimeter voltage ring is insulated from the…

Extreme ultraviolet reflective element with amorphous layers and method of manufacturing thereof

Granted: June 27, 2017
Patent Number: 9690016
An extreme ultraviolet reflective element and method of manufacture includes a substrate; a multilayer stack on the substrate, the multilayer stack includes a plurality of reflective layer pairs having a first reflective layer formed from silicon and a second reflective layer having a preventative layer separating a lower amorphous layer and an upper amorphous layer; and a capping layer on and over the multilayer stack for protecting the multilayer stack by reducing oxidation and…

Calibratable beam shaping system and method

Granted: June 27, 2017
Patent Number: 9690105
A beam shaping system including: a first and second optical modules that are accommodated in a spaced-apart relationship in an optical path of light through the system to sequentially apply beam shaping to light incident thereon. The beam shaping system includes first and second alignment modules respectively carrying the first and second optical modules and operable for laterally positioning the optical modules with respect to the optical path. A calibration module of the beam shaping…

Bolted wafer chuck thermal management systems and methods for wafer processing systems

Granted: June 27, 2017
Patent Number: 9691645
A workpiece holder includes a puck, first and second heating devices in thermal communication with respective inner and outer portions of the puck, and a thermal sink in thermal communication with the puck. The first and second heating devices are independently controllable, and the first and second heating devices are in greater thermal communication with the puck, than thermal communication of the thermal sink with the puck. A method of controlling temperature distribution of a…

Substrate transfer robot with chamber and substrate monitoring capability

Granted: June 27, 2017
Patent Number: 9691650
A method and apparatus for a transfer robot that having at least one image sensor disposed thereon is provided. The transfer robot includes a lift assembly having a first drive assembly for moving a first platform relative to a second platform in a first linear direction, an end effector assembly disposed on the second platform and movable in a second linear direction by a second drive assembly, the second linear direction being orthogonal to the first linear direction, at least one…

Method for forming interconnects

Granted: June 27, 2017
Patent Number: 9691660
A method of forming an interconnect composed of metallized lines and vias in a workpiece includes forming metal lines in a workpiece, with the metal lines disposed in longitudinally spaced-apart line segments, the line segments spaced apart from each other end-to-end; and forming vias in a workpiece, wherein at least one end of a first formed metal line constrains one cross-sectional dimension of a second formed via, or wherein at least one end of a first formed via constrains one…

Showerhead for a semiconductor processing chamber

Granted: June 20, 2017
Patent Number: D790039

Substrate processing system having susceptorless substrate support with enhanced substrate heating control

Granted: June 20, 2017
Patent Number: 9682398
Methods and apparatus for processing substrates are provided herein. In some embodiments, an apparatus includes a process kit, the process kit comprising a first ring to support a substrate proximate a peripheral edge of the substrate; a second ring disposed about the first ring; and a path formed between the first and second rings that allows the first ring to rotate with respect to the second ring, wherein the path substantially prevents light from travelling between a first volume…

Deposition of films comprising aluminum alloys with high aluminum content

Granted: June 20, 2017
Patent Number: 9683287
Films comprising Aluminum, carbon and a metal, wherein the aluminum is present in an amount greater than about 16% by elemental content and the film has less than about 50% carbon. Methods of forming the films comprise exposing a substrate to a metal halide precursor, purging the metal halide precursor from the processing chamber and then exposing the substrate to an alkyl aluminum precursor and an alane precursor, either sequentially or simultaneously. The alane precrursor comprises an…

Method and apparatus for precleaning a substrate surface prior to epitaxial growth

Granted: June 20, 2017
Patent Number: 9683308
Embodiments of the present invention generally relate to methods for removing contaminants and native oxides from substrate surfaces. The methods generally include removing contaminants disposed on the substrate surface using a plasma process, and then cleaning the substrate surface by use of a remote plasma assisted dry etch process.

HDD pattern implant system

Granted: June 20, 2017
Patent Number: 9685186
Methods and apparatus for forming substrates having magnetically patterned surfaces is provided. A magnetic layer comprising one or more materials having magnetic properties is formed on a substrate. The magnetic layer is subjected to a patterning process in which selected portions of the surface of the magnetic layer are altered such that the altered portions have different magnetic properties from the non-altered portions without changing the topography of the substrate. A protective…

Carbon and/or nitrogen incorporation in silicon based films using silicon precursors with organic co-reactants by PE-ALD

Granted: June 20, 2017
Patent Number: 9685325
Methods for the deposition of a silicon-containing film using an organic reactant, a silicon precursor and a plasma.

Apparatus for conserving electronic device manufacturing resources including ozone

Granted: June 20, 2017
Patent Number: 9685352
An electronic device manufacturing system is provided that may reduce the amount of resources used in electronic device manufacturing processes. In some embodiments, unreacted ozone exiting a process tool operating in an ozone mode may be diverted and used as an oxidant in an abatement tool when the process tool is operating in a non-ozone mode. Numerous other embodiments are provided.

Substrate support assembly having metal bonded protective layer

Granted: June 20, 2017
Patent Number: 9685356
A substrate support assembly comprises a ceramic body and a thermally conductive base bonded to a lower surface of the ceramic body. The substrate support assembly further comprises a protective layer metal bonded to an upper surface of the ceramic body, wherein the protective layer is a bulk sintered ceramic article.

Method of enabling seamless cobalt gap-fill

Granted: June 20, 2017
Patent Number: 9685371
Methods for depositing a metal layer in a feature definition of a semiconductor device are provided. In one implementation, a method for depositing a metal layer for forming a semiconductor device is provided. The method comprises performing a cyclic metal deposition process to deposit a metal layer on a substrate and annealing the metal layer disposed on the substrate. The cyclic metal deposition process comprises exposing the substrate to a deposition precursor gas mixture to deposit a…

Contact process flow

Granted: June 20, 2017
Patent Number: 9685374
Embodiments described herein generally relate to forming a semiconductor structure. In one embodiment, a method of forming a semiconductor structure is formed herein. The method includes exposing an oxide layer of the semiconductor structure, depositing a polysilicon layer on the semiconductor structure, filling a first gap formed by exposing the oxide layer, depositing a hard mask on the polysilicon layer, selectively removing the hard mask and the polysilicon layer, depositing an oxide…

Complex showerhead coating apparatus with electrospray for lithium ion battery

Granted: June 20, 2017
Patent Number: 9685655
A method and apparatus for forming battery active material on a substrate are disclosed. In one embodiment, an apparatus for depositing a battery active material on a surface of a substrate includes a substrate conveyor system for transporting the substrate within the apparatus, a material spray assembly disposed above the substrate conveyor system, and a first heating element disposed adjacent to the material spray assembly above the substrate conveyor system configured to heat the…