Applied Materials Patent Grants

Shadow frame support

Granted: July 18, 2017
Patent Number: 9708709
The present invention generally provides a processing chamber having shadow frame supports that direct cleaning gas flow to the corners of the chamber. The shadow frame supports are disposed along part of the chamber walls, thus leaving the corners unoccupied. During cleaning, the shadow frame is disposed in a way that it rests on both the substrate support and the shadow frame supports. Therefore, the cleaning gas flowing along the chamber walls is blocked by the shadow frame supports…

Aerosol deposition coating for semiconductor chamber components

Granted: July 18, 2017
Patent Number: 9708713
A method for coating a component for use in a semiconductor chamber for plasma etching includes providing the component and loading the component in a deposition chamber. A pressure in the deposition chamber is reduced to below atmospheric pressure. A coating is deposited on the component by spraying an aerosol comprising a suspension of a first type of metal oxide nanoparticle and a second type of metal oxide nanoparticle onto the component at approximately room temperature.

Method and system for optimizing configurable parameters of inspection tools

Granted: July 18, 2017
Patent Number: 9711327
A method, computer product and system for optimization of configurable parameters of inspection tools are provided. The method includes applying a heuristic that utilizes a prioritized sequence of selections of configurable parameters. For each configuration setting of the heuristic the method includes providing a set of local scan images of a list of DOIs, calculating an optimization target function and updating the configuration settings with the best value of each scanned parameter…

RF multi-feed structure to improve plasma uniformity

Granted: July 18, 2017
Patent Number: 9711330
A plasma source assembly for use with a processing chamber is described. The assembly includes a multi-feed RF power connection to a single or multiple RF hot electrodes.

Ion assisted deposition for rare-earth oxide based thin film coatings on process rings

Granted: July 18, 2017
Patent Number: 9711334
A method of manufacturing an article comprises providing a ring for an etch reactor. Ion assisted deposition (IAD) is then performed to deposit a protective layer on at least one surface of the ring, wherein the protective layer is a plasma resistant rare earth oxide film having a thickness of less than 300 ?m and an average surface roughness of less than 6 micro-inches.

Methods to improve in-film particle performance of amorphous boron-carbon hardmask process in PECVD system

Granted: July 18, 2017
Patent Number: 9711360
Implementations of the present disclosure generally relate to the fabrication of integrated circuits. More particularly, the implementations described herein provide techniques for deposition of boron-containing amorphous carbon films on a substrate with reduced particle contamination. In one implementation, the method comprises flowing a hydrocarbon-containing gas mixture into a processing volume having a substrate positioned therein, flowing a boron-containing gas mixture into the…

Selective etch for metal-containing materials

Granted: July 18, 2017
Patent Number: 9711366
Methods of selectively etching metal-containing materials from the surface of a substrate are described. The etch selectively removes metal-containing materials relative to silicon-containing films such as silicon, polysilicon, silicon oxide, silicon germanium and/or silicon nitride. The methods include exposing metal-containing materials to halogen containing species in a substrate processing region. A remote plasma is used to excite the halogen-containing precursor and a local plasma…

Methods and apparatus for post-chemical mechanical planarization substrate cleaning

Granted: July 18, 2017
Patent Number: 9711381
A method and apparatus for cleaning a substrate after chemical mechanical planarizing (CMP) is provided. The apparatus comprises a housing, a substrate holder rotatable on a first axis and configured to retain a substrate in a substantially vertical orientation, a first pad holder having a pad retaining surface facing the substrate holder in a parallel and spaced apart relation, the first pad holder rotatable on a second axis disposed parallel to the first axis, a first actuator operable…

Dome cooling using compliant material

Granted: July 18, 2017
Patent Number: 9711382
Embodiments described herein generally relate to apparatus for processing substrates. The apparatus generally include a process chamber including a lamp housing containing lamps positioned adjacent to an optically transparent window. Lamps within the lamp housing provide radiant energy to a substrate positioned on the substrate support. Temperature control of the optically transparent window is facilitated using cooling channels within the lamp housing. The lamp housing is thermally…

Electrostatic chuck for high temperature process applications

Granted: July 18, 2017
Patent Number: 9711386
Embodiments of the present invention provide a substrate support assembly including an electrostatic chuck with enhanced heat resistance. In one embodiment, an electrostatic chuck includes a support base, an electrode assembly having interleaved electrode fingers formed therein, and an encapsulating member disposed on the electrode assembly, wherein the encapsulating member is fabricated from one of a ceramic material or glass.

Cobalt resistance recovery by hydrogen anneal

Granted: July 18, 2017
Patent Number: 9711397
Resistance increase in Cobalt interconnects due to nitridation occurring during removal of surface oxide from Cobalt interconnects and deposition of Nitrogen-containing film on Cobalt interconnects is solved by a Hydrogen thermal anneal or plasma treatment. Removal of the Nitrogen is through a thin overlying layer which may be a dielectric barrier layer or an etch stop layer.

Multi-spot collection optics

Granted: July 11, 2017
Patent Number: 9702983
Apparatus for detecting optical radiation emitted from an array of spots on an object. The apparatus includes a plurality of light guides having respective input ends and output ends, with the input ends ordered in a geometrical arrangement corresponding to the array of the spots. Relay optics collect and focus the optical radiation from the object onto the input ends such that each input end receives the optical radiation from a corresponding one of the spots. Multiple detectors and…

Halogenated dopant precursors for epitaxy

Granted: July 11, 2017
Patent Number: 9704708
A method for forming a film on a substrate is provided. The method includes positioning a substrate within a processing volume of a process chamber and heating the substrate. The method further includes forming a semiconductor film on the substrate by exposing the substrate to two or more reactants including a silicon source and a halogenated dopant source. The semiconductor film includes one or more epitaxial regions and one or more non-epitaxial regions.

Electrochemical plating methods

Granted: July 11, 2017
Patent Number: 9704717
An electrochemical process for applying a conductive film onto a substrate having a seed layer includes placing the substrate into contact with an electrochemical plating bath containing cobalt or nickel, with the plating bath having pH of 4.0 to 9.0. Electric current is conducted through the bath to the substrate. The cobalt or nickel ions in the bath deposit onto the seed layer. The plating bath may contain cobalt chloride and glycine. The electric current may range from 1-50…

Processing systems and methods for halide scavenging

Granted: July 11, 2017
Patent Number: 9704723
Systems, chambers, and processes are provided for controlling process defects caused by moisture contamination. The systems may provide configurations for chambers to perform multiple operations in a vacuum or controlled environment. The chambers may include configurations to provide additional processing capabilities in combination chamber designs. The methods may provide for the limiting, prevention, and correction of aging defects that may be caused as a result of etching processes…

Application of in-line glass edge-inspection and alignment check in display manufacturing

Granted: July 11, 2017
Patent Number: 9704762
Methods and apparatus for determining substrate integrity and alignment are described. Devices as described herein can include a transfer chamber, one or more process chambers, a loadlock chamber a first optical device, a second optical device and a radiation source positioned outside and above an opening for the loadlock chamber. Methods as described herein can include delivering a substrate to an opening in a process chamber, activating the optical device and the radiation source and…

Substrate support with feedthrough structure

Granted: July 11, 2017
Patent Number: 9706605
Apparatus for providing electrical currents and substrate supports utilizing the same are provided. In some embodiments, a feedthrough structure may include a body having a wall defining one or more openings disposed through the body from a first end to a second end; one or more first conductors and one or more second conductors each disposed in the wall from the first end to the second end; and a plurality of conductive mesh disposed in the wall, at least one conductive mesh surrounding…

Stepped retaining ring

Granted: July 4, 2017
Patent Number: 9694470
A two part retaining ring is described. A rigid upper portion has an annular recess along its inner diameter. An annular wearable lower portion has an inner diameter, an annular extension defined by the inner diameter and a vertical wall that is perpendicular to a surface of the second portion and opposite to the inner diameter. The annular extension fits into the annular recess of the annular first portion. A bonding material is on the vertical wall of the annular second portion.

Process kit with plasma-limiting gap

Granted: July 4, 2017
Patent Number: 9695502
Apparatus for processing substrates are provided herein. In some embodiments, an apparatus includes a process kit comprising a shield having one or more sidewalls configured to surround a first volume, the first volume disposed within an inner volume of a process chamber; and a first ring moveable between a first position, wherein the first ring rests on the shield, and a second position, wherein a gap is formed between an outer surface of the first ring and an inner surface of the one…

High power impulse magnetron sputtering process to achieve a high density high SP3 containing layer

Granted: July 4, 2017
Patent Number: 9695503
Methods for depositing a nanocrystalline diamond layer are disclosed herein. The method can include delivering a sputter gas to a substrate positioned in a processing region of a first process chamber, the first process chamber having a carbon-containing sputter target, delivering an energy pulse to the sputter gas to create a sputtering plasma, the sputtering plasma having a sputtering duration, the energy pulse having an average power between 1 W/cm2 and 10 W/cm2 and a pulse width…