System for forming nano-laminate optical coating
Granted: February 13, 2024
Patent Number:
11897811
A processing system for forming an optical coating on a substrate is provided, wherein the optical coating including an anti-reflective coating and an oleophobic coating, the system comprising: a linear transport processing section configured for processing and transporting substrate carriers individually and one at a time in a linear direction; at least one evaporation processing system positioned in the linear transport processing system, the evaporation processing system configured to…
System for forming nano-laminate optical coating
Granted: February 13, 2024
Patent Number:
11897811
A processing system for forming an optical coating on a substrate is provided, wherein the optical coating including an anti-reflective coating and an oleophobic coating, the system comprising: a linear transport processing section configured for processing and transporting substrate carriers individually and one at a time in a linear direction; at least one evaporation processing system positioned in the linear transport processing system, the evaporation processing system configured to…
Ion implantation for modification of thin film coatings on glass
Granted: February 22, 2022
Patent Number:
11255013
The use of non-mass analyzed ion implanter is advantageous in such application as it generates ion implanting at different depth depending on the ions energy and mass. This allows for gaining advantage from lubricity offered as a result of the very light deposition on the surface, and at the same time the hardness provided by the intercalated ions implanted below it, providing benefits for cover glass, low E enhancement, and other similar materials. In further aspects, ion implantation…
System for forming nano-laminate optical coating
Granted: February 1, 2022
Patent Number:
11236013
A processing system for forming an optical coating on a substrate is provided, wherein the optical coating including an anti-reflective coating and an oleophobic coating, the system comprising: a linear transport processing section configured for processing and transporting substrate carriers individually and one at a time in a linear direction; at least one evaporation processing system positioned in the linear transport processing system, the evaporation processing system configured to…
Multi-colored dielectric coating
Granted: November 30, 2021
Patent Number:
11187834
A multi-color dielectric coating is formed using interleaved layers of dielectric material, having alternating refractive index, to create reflections at selected wavelengths, thus appearing as different colors. Etching of selected layers at selected locations changes the color appearance of the etched locations, thus generating a coating having multiple colors. The thicknesses of the layers are chosen such that the path-length differences for reflections from different high-index layers…
Optical coating having nano-laminate for improved durability
Granted: March 23, 2021
Patent Number:
10955589
An optical coating, such as anti-reflective coating (ARC) or colored coating for optical devices, suitable especially for mobile devices. The ARC is made up of alternating layers of low refractive index and high refractive index. At least one of the layers, preferably the top layer, is made up of nano-laminate. The nano-laminate is a structure of alternating nano-layers, each nano-layer made out of a material having refractive index similar to the layer it replaces. Optionally, each of…
Multi-piece substrate holder and alignment mechanism
Granted: December 1, 2020
Patent Number:
10854772
A system for transporting substrates and precisely align the substrates horizontally and vertically. The system decouples the functions of transporting the substrates, vertically aligning the substrates, and horizontally aligning the substrates. The transport system includes a carriage upon which plurality of chuck assemblies are loosely positioned, each of the chuck assemblies includes a base having vertical alignment wheels to place the substrate in precise vertical alignment. A…
System architecture for combined static and pass-by processing
Granted: August 25, 2020
Patent Number:
10752987
Disclosed is a substrate processing system which enables combined static and pass-by processing. Also, a system architecture is provided, which reduces footprint size. The system is constructed such that the substrates are processed therein vertically, and each chamber has a processing source attached to one sidewall thereof, wherein the other sidewall backs to a complementary processing chamber. The chamber system can be milled from a single block of metal, e.g., aluminum, wherein the…
Thermally assisted negative electron affinity photocathode
Granted: June 23, 2020
Patent Number:
10692683
A novel photocathode employing a conduction band barrier is described. Incorporation of a barrier optimizes a trade-off between photoelectron transport efficiency and photoelectron escape probability. The barrier energy is designed to achieve a net increase in photocathode sensitivity over a specific operational temperature range.
Wafer plate and mask arrangement for substrate fabrication
Granted: June 9, 2020
Patent Number:
10679883
A system for processing wafers in a vacuum processing chamber. Carrier comprising a frame having a plurality of openings, each opening configured to accommodate one wafer. A transport mechanism configured to transport the plurality of carriers throughout the system. A plurality of wafer plates configured for supporting wafers. An attachment mechanism for attaching a plurality of wafer plates to each of the carriers, wherein each of the wafer plates is attached to a corresponding position…
Ion implant system having grid assembly
Granted: April 28, 2020
Patent Number:
10636935
An ion implantation system having a grid assembly. The system includes a plasma source configured to provide plasma in a plasma region; a first grid plate having a plurality of apertures configured to allow ions from the plasma region to pass therethrough, wherein the first grid plate is configured to be biased by a power supply; a second grid plate having a plurality of apertures configured to allow the ions to pass therethrough subsequent to the ions passing through the first grid…
System of height and alignment rollers for precise alignment of wafers for ion implantation
Granted: February 11, 2020
Patent Number:
10559710
A system for transporting substrates and precisely alignment the substrates to shadow masks. The system decouples the functions of transporting the substrates, vertically aligning the substrates, and horizontally aligning the substrates. The transport system includes a carriage upon which plurality of pedestals are loosely positioned, each of the pedestals includes a base having vertical alignment wheels to place the substrate in precise vertical alignment. Two sidebars are configured to…
Patterned chuck for substrate processing
Granted: October 15, 2019
Patent Number:
10446430
A chuck for wafer processing that counters the deleterious effects of thermal expansion of the wafer. Also, a combination of chuck and shadow mask arrangement that maintains relative alignment between openings in the mask and the wafer in spite of thermal expansion of the wafer. A method for fabricating a solar cell by ion implant, while maintaining relative alignment of the implanted features during thermal expansion of the wafer.
Adaptive XDR via reset and mean signal values
Granted: September 24, 2019
Patent Number:
10425589
Dynamic range of a photosensor is controlled dynamically improving image detail especially in dark and bright areas of the image. At least one reset threshold and one reset value are set. At the end of the frame integration the value of the average pixel and the value of the brightest pixel that was not reset are determined and, based on that, at least one of the reset threshold and the reset value are changed. The change may reduce/increase the reset threshold such that more/less pixels…
In line fan out system
Granted: September 17, 2019
Patent Number:
10418260
A system for fan out chip encapsulation processing is provided, wherein a plurality of microchips are encapsulated in molding compound, the system comprising: an atmospheric loading camber, configured to load substrates onto carriers in atmospheric environment; an entry loadlock arrangement configured to introduce the carriers into vacuum environment of the system; a degas chamber positioned downstream of the loadlock arrangement within the vacuum environment, the degas chamber…
Biocular compact collimation apparatus
Granted: February 5, 2019
Patent Number:
10197802
A compact, lightweight, multi-wavelength display system which can be used for simultaneous viewing with both eyes is provided. The system utilizes a field flattener lens to remove abrasions introduced by the system's lenses. The system also uses a polarization selective optical element that reflects one linear polarization state while transmitting radiation of the orthogonal linear polarization state. The PS element is used in combination with a quarter wave plate and an optical element,…
System architecture for vacuum processing
Granted: October 30, 2018
Patent Number:
10115617
A system for processing substrates in plasma chambers, such that all substrates transport and loading/unloading operations are performed in atmospheric environment, but processing is performed in vacuum environment. The substrates are transported throughout the system on carriers. The system's chambers are arranged linearly, such that carriers move from one chamber directly to the next. A conveyor, placed above or below the system's chambers, returns the carriers to the system's entry…
Sputtering system and method using direction-dependent scan speed or power
Granted: October 23, 2018
Patent Number:
10106883
A sputtering system having a processing chamber with an inlet port and an outlet port, and a sputtering target positioned on a wall of the processing chamber. A movable magnet arrangement is positioned behind the sputtering target and reciprocally slides behind the target. A conveyor continuously transports substrates at a constant speed past the sputtering target, such that at any given time, several substrates face the target between the leading edge and the trailing edge. In certain…
System and method for bi-facial processing of substrates
Granted: August 28, 2018
Patent Number:
10062600
A system for processing substrates in plasma chambers, such that all substrates transport and loading/unloading operations are performed in atmospheric environment, but processing is performed in vacuum environment. The substrates are transported throughout the system on carriers. The system's chambers are arranged linearly, such that carriers move from one chamber directly to the next. A conveyor, placed above or below the system's chambers, returns the carriers to the system's entry…
System architecture for combined static and pass-by processing
Granted: March 13, 2018
Patent Number:
9914994
Disclosed is a substrate processing system which enables combined static and pass-by processing. Also, a system architecture is provided, which reduces footprint size. The system is constructed such that the substrates are processed therein vertically, and each chamber has a processing source attached to one sidewall thereof, wherein the other sidewall backs to a complementary processing chamber. The chamber system can be milled from a single block of metal, e.g., aluminum, wherein the…
