Mattson Technology Profile

Mattson Technology Patent Grants

Low cost high throughput processing platform

Patent Number 9493306 - November 15, 2016

As part of a system for processing workpieces, a workpiece support arrangement, separate from a process chamber arrangement supports at least…

Repeatable heat-treating methods and apparatus

Patent Number 9482468 - November 1, 2016

A first heat-treating method involves monitoring at least one thermal efficiency parameter associated with an irradiance system configured to…

Mask removal process strategy for vertical NAND device

Patent Number 9396963 - July 19, 2016

A method for removing a doped amorphous carbon mask from a semiconductor substrate is disclosed. The method comprises generating a plasma to…

Methods, apparatus and media for determining a shape of an irradiance pulse to which a workpiece is to be exposed

Patent Number 9279727 - March 8, 2016

A method and system for determining a shape of an irradiance pulse to which a semiconductor wafer is to be exposed during a thermal cycle are…

Apparatus and methods for generating electromagnetic radiation

Patent Number 9245730 - January 26, 2016

An apparatus for generating electromagnetic radiation includes an envelope, a vortex generator configured to generate a vortexing flow of…

Mattson Technology Patent Applications

System and Method for Protection of Vacuum Seals in Plasma Processing Systems

Application Number 20160013025 - January 14, 2016

Systems and methods for protecting vacuum seals in a plasma processing system are provided. The processing system can include a vacuum chamber…

APPARATUS AND METHODS FOR GENERATING ELECTROMAGNETIC RADIATION

Application Number 20150035436 - February 5, 2015

An apparatus for generating electromagnetic radiation includes an envelope, a vortex generator configured to generate a vortexing flow of…

Heating Configuration for Use in Thermal Processing Chambers

Application Number 20140246422 - September 4, 2014

An apparatus for heat treating semiconductor wafers is disclosed. The apparatus includes a heating device which contains an assembly linear…

LOW COST HIGH THROUGHPUT PROCESSING PLATFORM

Application Number 20140151195 - June 5, 2014

As part of a system for processing workpieces, a workpiece support arrangement, separate from a process chamber arrangement supports at least…

METHODS, APPARATUS AND MEDIA FOR DETERMINING A SHAPE OF AN IRRADIANCE PULSE TO WHICH A WORKPIECE IS TO BE EXPOSED

Application Number 20130306871 - November 21, 2013

A method and system for determining a shape of an irradiance pulse to which a semiconductor wafer is to be exposed during a thermal cycle are…