Nanometrics Profile

Nanometrics Patent Grants

Simultaneous measurement of multiple overlay errors using diffraction based overlay

Patent Number 9547244 - January 17, 2017

A plurality of overlay errors in a structure is determined using a target that includes a plurality of diffraction based overlay pads. Each…

Ellipsometer focusing system

Patent Number 9243999 - January 26, 2016

An ellipsometer includes an integrated focusing system with a beam splitter between the sample and the ellipsometer detector. The beam…

Diffraction based overlay linearity testing

Patent Number 9239523 - January 19, 2016

An empirical diffraction based overlay (eDBO) measurement of an overlay error is produced using diffraction signals from a plurality of…

Optical metrology system for spectral imaging of a sample

Patent Number 9182351 - November 10, 2015

An optical metrology device is capable of detection of any combination of photoluminescence light, specular reflection of broadband light, and…

Optical metrology with multiple angles of incidence and/or azimuth angles

Patent Number 9115987 - August 25, 2015

An optical metrology device simultaneously detects light with multiple angles of incidence (AOI) and/or multiple azimuth angles to determine…

Nanometrics Patent Applications

FOCUSING SYSTEM WITH FILTER FOR OPEN OR CLOSED LOOP CONTROL

Application Number 20150168290 - June 18, 2015

An optical metrology device, such as an ellipsometer, includes a focusing system that adjusts the focal position of the metrology device in…

OPTICAL METROLOGY WITH MULTIPLE ANGLES OF INCIDENCE AND/OR AZUMITH ANGLES

Application Number 20150153165 - June 4, 2015

An optical metrology device simultaneously detects light with multiple angles of incidence (AOI) and/or multiple azimuth angles to determine…

OPTICAL METROLOGY SYSTEM FOR SPECTRAL IMAGING OF A SAMPLE

Application Number 20150146193 - May 28, 2015

An optical metrology device is capable of detection of any combination of photoluminescence light, specular reflection of broadband light, and…

ELLIPSOMETER FOCUSING SYSTEM

Application Number 20140098369 - April 10, 2014

An ellipsometer includes an integrated focusing system with a beam splitter between the sample and the ellipsometer detector. The beam…

DARK FIELD DIFFRACTION BASED OVERLAY

Application Number 20130278942 - October 24, 2013

A dark field diffraction based overlay metrology device illuminates an overlay target that has at least three pads for an axis, the three pads…

Nanometrics Federal District Court Decisions

Nanometrics Incorporated v. Nova Measuring Instruments Ltd. et al

California Northern District Court - October 24, 2006

SUPPLEMENTAL ORDER TO ORDER SETTING INITIAL CASE MANAGEMENT CONFERENCE re 7 Clerks Notice. Signed by Judge William Alsup on 4/18/06. (dt,…