Plasma shaper to control ion flux distribution of plasma source
Granted: March 11, 2025
Patent Number:
12249488
Provided herein are approaches for providing a more uniform ion flux and ion angular distribution across a wafer to minimize etch yield loss resulting from etch profile variations. In some embodiments, a system may include a plasma source operable to generate a plasma within a plasma chamber enclosed by a chamber housing, wherein the plasma source comprises a plasma shaper extending into the plasma chamber from a wall of the chamber housing. The plasma shaper may include a shaper wall…
Prediction of electrical properties of a semiconductor specimen
Granted: March 11, 2025
Patent Number:
12250503
There is provided a method and a system configured to obtain metrology data Dmetrology informative of a plurality of structural parameters of a semiconductor specimen, obtain a model informative of a relationship between at least some of said structural parameters and one or more electrical properties of the specimen, use the model and Dmetrology to determine, for at least one given electrical property of the specimen, one or more given structural parameters among the plurality of…
Arsenic diffusion profile engineering for transistors
Granted: March 11, 2025
Patent Number:
12249626
Embodiments of the present disclosure relate to methods for forming a source/drain extension. In one embodiment, a method for forming an nMOS device includes forming a gate electrode and a gate spacer over a first portion of a semiconductor fin, removing a second portion of the semiconductor fin to expose a side wall and a bottom, forming a silicon arsenide (Si:As) layer on the side wall and the bottom, and forming a source/drain region on the Si:As layer. During the deposition of the…
Substrate flipping in vacuum for dual sided PVD sputtering
Granted: March 11, 2025
Patent Number:
12249537
A module of a processing system for flipping a substrate in vacuum includes a clamp assembly for securing the substrate, a first motor assembly coupled to the clamp assembly for rotating the clamp assembly, and a second motor assembly coupled to the first motor assembly for raising and lowering the first motor assembly and the clamp assembly.
Using spectroscopic measurements for substrate temperature monitoring
Granted: March 11, 2025
Patent Number:
12249525
Systems, methods, and computer-readable mediums for monitoring temperature of a substrate are described. Spectroscopic measurements are performed on a surface of the substrate using a metrology tool integrated with a processing tool. The measurements may be used to determine that the substrate has cooled below a threshold temperature using the spectroscopic measurements.
Processing chamber with annealing mini-environment
Granted: March 11, 2025
Patent Number:
12249522
Apparatus and methods to process one or more wafers are described. The apparatus comprises a chamber defining an upper interior region and a lower interior region. A heater assembly is on the bottom of the chamber body in the lower interior region and defines a process region. A wafer cassette assembly is inside the heater assembly and a motor is configured to move the wafer cassette assembly from the lower process region inside the heater assembly to the upper interior region.
Treatments to improve device performance
Granted: March 11, 2025
Patent Number:
12249511
A method of forming a semiconductor structure includes annealing a surface of a substrate in an ambient of hydrogen to smooth the surface, pre-cleaning the surface of the substrate, depositing a high-? dielectric layer on the pre-cleaned surface of the substrate, performing a re-oxidation process to thermally oxidize the surface of the substrate; performing a plasma nitridation process to insert nitrogen atoms in the deposited high-? dielectric layer, and performing a post-nitridation…
Selective deposition of carbon on photoresist layer for lithography applications
Granted: March 11, 2025
Patent Number:
12249509
A method for etching a hardmask layer includes forming a photoresist layer comprising an organometallic material on a hardmask layer comprising a metal-containing material, exposing the photoresist layer to ultraviolet radiation through a mask having a selected pattern, removing un-irradiated areas of the photoresist layer to pattern the photoresist layer, forming a passivation layer comprising a carbon-containing material selectively on a top surface of the patterned photoresist layer,…
Remote plasma cleaning of chambers for electronics manufacturing systems
Granted: March 11, 2025
Patent Number:
12249494
A method of cleaning a chamber for an electronics manufacturing system includes flowing a gas mixture comprising oxygen and a carrier gas into a remote plasma generator. The method further includes generating a plasma from the gas mixture by the remote plasma generator and performing a remote plasma cleaning of the chamber by flowing the plasma into an interior of the chamber, wherein the plasma removes a plurality of organic contaminants from the chamber.
Optical device improvement
Granted: March 11, 2025
Patent Number:
12249489
A method of processing an optical device is provided, including: positioning an optical device on a substrate support in an interior volume of a process chamber, the optical device including an optical device substrate and a plurality of optical device structures formed over the optical device substrate, each optical device structure including a bulk region formed of silicon carbide and one or more surface regions formed of silicon oxycarbide. The method further includes providing one or…
Methods and apparatus for controlling radio frequency electrode impedances in process chambers
Granted: March 11, 2025
Patent Number:
12249484
Methods and apparatus for controlling plasma in a process chamber leverage an RF termination filter which provides an RF path to ground. In some embodiments, an apparatus may include a DC filter configured to be electrically connected between a DC power supply and electrodes embedded in an electrostatic chuck where the DC filter is configured to block DC current from the DC power supply from flowing through the DC filter and an RF termination filter configured to be electrically…
Universal metrology file, protocol, and process for maskless lithography systems
Granted: March 11, 2025
Patent Number:
12248254
Embodiments of the present disclosure relate to a system, a software application, and a method of a lithography process to update one or more of a mask pattern, maskless lithography device parameters, lithography process parameters utilizing a file readable by each of the components of a lithography environment. The file readable by each of the components of a lithography environment stores and shares textual data and facilitates communication between of the components of a lithography…
Freeform optical substrates in waveguide displays
Granted: March 11, 2025
Patent Number:
12248246
Embodiments of the present disclosure generally relate to methods of forming a substrate having a target thickness distribution at one or more eyepiece areas across a substrate. The substrate includes eyepiece areas corresponding to areas where optical device eyepieces are to be formed on the substrate. Each eyepiece area includes a target thickness distribution. A base substrate thickness distribution of a base substrate is measured such that a target thickness change can be determined.…
Method and apparatus for controlled ion implantation
Granted: March 11, 2025
Patent Number:
12247283
A method of operating a beamline ion implanter may include performing, in an ion implanter, a first implant procedure to implant a dopant of a first polarity into a given semiconductor substrate, and generating an estimated implant dose of the dopant of the first polarity based upon a set of filtered information, generated by the first implant procedure. The method may also include calculating an actual implant dose of the dopant of the first polarity using a predictive model based upon…
Patterned heater pedestal with groove extensions
Granted: March 11, 2025
Patent Number:
D1066620
Process chamber pumping liner
Granted: March 11, 2025
Patent Number:
D1066440
Baffle for anti-rotation process kit for substrate processing chamber
Granted: March 11, 2025
Patent Number:
D1066275
Constant headspace ampoule
Granted: March 4, 2025
Patent Number:
12241594
Ampoules including a housing, a lid and a floating structure are described. The floating structure includes a float with a volume determined to displace a predetermined volume of liquid within the ampoule. An outlet channel extends from the top surface of the float. A baffle is positioned along the length of the outlet channel and creates a saturation zone between the baffle and the float.
Conformal oxidation for gate all around nanosheet I/O device
Granted: March 4, 2025
Patent Number:
12243941
Horizontal gate-all-around devices and methods of manufacturing the same are described. The hGAA devices comprise an oxidize layer on a semiconductor material between source regions and drain regions of the device. The method includes radical plasma oxidation (RPO) of semiconductor material layers between source regions and drain regions of an electronic device.
Micro-LED displays to reduce subpixel crosstalk
Granted: March 4, 2025
Patent Number:
12243864
A display screen includes a backplane, an array of light-emitting diodes electrically integrated with the backplane, the array of light-emitting diodes configured to emit UV light in a first wavelength range, and a plurality of isolation walls formed on the backplane between adjacent light-emitting diodes of the array of light-emitting diodes with the isolation walls spaced apart from the light-emitting diodes and extending above the light-emitting diodes. The plurality of isolation…
