Methods and apparatus for carbon compound film deposition
Granted: April 29, 2025
Patent Number:
12288672
A method and apparatus for depositing a carbon compound on a substrate includes using an inductively coupled plasma (ICP) chamber with a chamber body, a lid, an interior volume, a pumping apparatus, and a gas delivery system and a pedestal for supporting a substrate disposed within the interior volume of the ICP chamber, the pedestal has an upper portion formed from aluminum nitride with an upper surface that is configured to support and heat a substrate with embedded heating elements…
Cylindrical cavity with impedance shifting by irises in a power-supplying waveguide
Granted: April 29, 2025
Patent Number:
12288675
A plasma reactor has a cylindrical microwave cavity overlying a workpiece processing chamber, a microwave source having a pair of microwave source outputs, and a pair of respective waveguides. The cavity has first and second input ports in a sidewall and space apart by an azimuthal angle. Each of the waveguides has a microwave input end coupled to a microwave source output and a microwave output end coupled to a respective one of the first and second input ports, a coupling aperture…
Methods and apparatus for processing a substrate
Granted: April 29, 2025
Patent Number:
12288704
Methods and apparatus for processing a substrate are provided herein. For example, an apparatus for processing a substrate comprises a transfer robot configured to position a substrate on a substrate support disposed within an interior of a processing chamber configured to process the substrate and a sensor disposed on the transfer robot, operably connected to a controller of the processing chamber, and configured with an angle of view to provide in-situ continuous closed loop feedback…
Region classification of film non-uniformity based on processing of substrate images
Granted: April 29, 2025
Patent Number:
12288724
A method of classification of a film non-uniformity on a substrate includes obtaining a color image of a substrate with the color image comprising a plurality of color channels, obtaining a standard color for the color image of the substrate, for each respective pixel along a path in the color image determining a difference vector between the a color of the respective pixel and the standard color to generate a sequence of difference vectors, sorting the pixels along the path into a…
Time constraint management at a manufacturing system
Granted: April 29, 2025
Patent Number:
12287624
A method for time constraint management at a manufacturing system is provided. A first request to initiate a set of operations to be run at the manufacturing system is received. The set of operations include one or more operations that each have one or more time constraints. A first set of candidate substrates to be processed during the set of operations is determined. A first simulation of the set of operations for the first set of candidate substrates is run over a first period of…
Photoresist deposition using independent multichannel showerhead
Granted: April 22, 2025
Patent Number:
12282256
Some embodiments include a method of depositing a photoresist onto a substrate in a processing chamber. In an embodiment, the method comprises flowing an oxidant into the processing chamber through a first path in a showerhead, and flowing an organometallic into the processing chamber through a second path in the showerhead. In an embodiment, the first path is isolated from the second path so that the oxidant and the organometallic do not mix within the showerhead. In an embodiment, the…
System and methods for dram contact formation
Granted: April 22, 2025
Patent Number:
12284803
The present disclosure generally relates to dynamic random access memory (DRAM) devices and to semiconductor fabrication for DRAM devices. Certain embodiments disclosed herein provide an integrated processing system and methods for forming CMOS contact, DRAM array bit line contact (BLC), and storage node structures. The integrated processing system and methods enable deposition of contact and storage node layers with reduced contamination and improved quality, thus reducing leakage…
Chelating agents for quantum dot precursor materials in color conversion layers for micro-LEDs
Granted: April 22, 2025
Patent Number:
12283647
A photocurable composition includes quantum dots, quantum dot precursor materials, a chelating agent, one or more monomers, and a photoinitiator. The quantum dots are selected to emit radiation in a first wavelength band in the visible light range in response to absorption of radiation in a second wavelength band in the UV or visible light range. The second wavelength band is different than the first wavelength band. The quantum dot precursor materials include metal atoms or metal ions…
Substrate measurement subsystem
Granted: April 22, 2025
Patent Number:
12283503
A method for a substrate measurement subsystem is provided. An indication is received that a substrate being processed at a manufacturing system has been loaded into a substrate measurement subsystem. First positional data of the substrate within the substrate measurement subsystem is determined. One or more portions of the substrate to be measured by one or more sensing components of the substrate measurement subsystem are determined based on the first positional data of the substrate…
Methods and systems for temperature control for a substrate
Granted: April 22, 2025
Patent Number:
12283500
A direct current (DC) power is supplied to a heating element embedded into a substrate support assembly (SSA). A voltage across the heating element and a current through the heating element is measured as the DC power is supplied to the heating element. A resistance of the heating element is determined based on the measured voltage and current. A temperature measurement for the heating element and/or a zone including the heating element is obtained based on signal(s) of a temperature…
Selective deposition of carbon on photoresist layer for lithography applications
Granted: April 22, 2025
Patent Number:
12283484
Embodiments disclosed within include a method for etching a hardmask layer includes forming a photoresist layer comprising an organometallic material on a hardmask layer comprising a metal-containing material, exposing the photoresist layer to ultraviolet radiation through a mask having a selected pattern, removing un-irradiated areas of the photoresist layer to pattern the photoresist layer, forming a passivation layer comprising a carbon-containing material selectively on a top surface…
Closed loop faraday correction of a horizontal beam current profile for uniform current tuning
Granted: April 22, 2025
Patent Number:
12283460
A system and method for creating a beam current profile that eliminates variations that are not position dependent is disclosed. The system includes two Faraday sensors; one which is moved across the ion beam and a second that remains at or near a certain location. The reference Faraday sensor is used to measure temporal variations in the beam current, while the movable Faraday sensor measures both the position dependent variations and the temporal variations. By combining these…
Scheduling substrate routing and processing
Granted: April 22, 2025
Patent Number:
12282315
A method includes determining queue times associated with operations of a sequence recipe. The operations are associated with production of substrates in a substrate processing system. The method further includes generating a schedule based on the queue times. The method further includes transmitting the schedule to a controller of the substrate processing system. The controller is to control the substrate processing system to produce the substrates based on the schedule.
Method of depositing metal films
Granted: April 22, 2025
Patent Number:
12281387
Organometallic precursors and methods of depositing high purity metal films are discussed. Some embodiments utilize a method comprising exposing a substrate surface to an organometallic precursor comprising one or more of molybdenum (Mo), tungsten (W), osmium (Os), technetium (Tc), manganese (Mn), rhenium (Re) or ruthenium (Ru), and an iodine-containing reactant comprising a species having a formula RIx, where R is one or more of a C1-C10 alkyl, C3-C10 cycloalkyl, C2-C10 alkenyl, or…
Methods for depositing blocking layers on conductive surfaces
Granted: April 22, 2025
Patent Number:
12281382
Methods of selectively depositing blocking layers on conductive surfaces over dielectric surfaces are described. In some embodiments, a 4-8 membered substituted heterocycle is exposed to a substrate to selectively form a blocking layer. In some embodiments, a layer is selectively deposited on the dielectric surface after the blocking layer is formed. In some embodiments, the blocking layer is removed.
Methods and apparatus for processing a substrate
Granted: April 22, 2025
Patent Number:
12281381
Methods and apparatus for processing a substrate are provided herein. For example, a method for processing a substrate comprises supplying pulsed DC power to a target disposed in a processing volume of a processing chamber for depositing sputter material onto a substrate, during a pulse off time, determining if a reverse current is equal to or greater than at least one of a first threshold or a second threshold different from the first threshold, and if the reverse current is equal to or…
Apparatus and methods for susceptor deposition material removal
Granted: April 22, 2025
Patent Number:
12280465
Apparatus and method for removing material from the susceptor of a batch processing chamber are described. The apparatus comprises a polishing tool including a rotatable platen positioned above the susceptor. A method comprises contacting material deposited on the susceptor with the rotatable platen to remove the material from the susceptor.
Substrate support for a substrate processing chamber
Granted: April 22, 2025
Patent Number:
D1071886
Gas distribution plate
Granted: April 15, 2025
Patent Number:
D1071103
Method of dispensing paste for a printer using a paste dispensing apparatus and paste dispensing apparatus for dispensing paste for a printer
Granted: April 15, 2025
Patent Number:
12275232
A method of dispensing paste for a printer using a paste dispensing apparatus is provided. The paste dispensing apparatus includes a reservoir for storing a paste for a printer. The reservoir includes a stirrer for stirring the paste. The paste dispensing apparatus includes a receptacle for receiving paste from the reservoir. The paste dispensing apparatus includes a closable passage from the reservoir to the receptacle. The closable passage is changeable between an open state and a…
