Process-induced asymmetry detection, quantification, and control using patterned wafer geometry measurements
Granted: October 3, 2017
Patent Number:
9779202
Systems and methods to detect, quantify, and control process-induced asymmetric signatures using patterned wafer geometry measurements are disclosed. The system may include a geometry measurement tool configured to obtain a first set of wafer geometry measurements of the wafer prior to the wafer undergoing a fabrication process and to obtain a second set of wafer geometry measurements of the wafer after the fabrication process. The system may also include a processor in communication…
Metrology tool with combined XRF and SAXS capabilities
Granted: October 3, 2017
Patent Number:
9778213
Methods and systems for performing simultaneous X-ray Fluorescence (XRF) and small angle x-ray scattering (SAXS) measurements over a desired inspection area of a specimen are presented. SAXS measurements combined with XRF measurements enables a high throughput metrology tool with increased measurement capabilities. The high energy nature of x-ray radiation penetrates optically opaque thin films, buried structures, high aspect ratio structures, and devices including many thin film layers.…
Integrated multi-pass inspection
Granted: October 3, 2017
Patent Number:
9778207
Methods and systems for integrated multi-pass reticle inspection are provided. One method for inspecting a reticle includes acquiring at least first, second, and third images for the reticle. The first image is a substantially high resolution image of light transmitted by the reticle. The second image is a substantially high resolution image of light reflected from the reticle. The third image is an image of light transmitted by the reticle that is acquired with a substantially low…
Delta die and delta database inspection
Granted: October 3, 2017
Patent Number:
9778205
Disclosed are methods and apparatus for inspecting a photolithographic reticle. An inspection tool is used to obtain a plurality of patch area images of each patch area of each die of a set of identical dies on a reticle. An integrated intensity value for each patch area image is determined. A gain is applied to the integrated intensity value for each patch area image based on a pattern sparseness metric of such patch area image and its relative value to other patch area images' pattern…
Object carrier, system and method for back light inspection
Granted: October 3, 2017
Patent Number:
9778192
An object carrier, a system and a method is disclosed for the back light inspection of transparent or semitransparent objects. The carrier has a carrier base layer with photo luminescent properties which carries the transparent or semitransparent object on top of the layer. The transparent or semitransparent object could be a wafer and the object carrier could be a wafer chuck. At least one light source being arranged above the object carrier such that excitation light emitted from the…
System for electron beam detection
Granted: October 3, 2017
Patent Number:
9778186
An electron beam detection apparatus includes a first aperture element including a first set of apertures. The apparatus includes a second aperture element including a second set of apertures. The second set of apertures is arranged in a pattern corresponding with the pattern of the first plurality of apertures. The detection apparatus includes an electron-photon conversion element configured to receive electrons of the electron beam transmitted through the first and second aperture…
Apparatus and method for automatic pitch conversion of pick and place heads, pick and place head and pick and place device
Granted: October 3, 2017
Patent Number:
9776334
An apparatus for automatic pitch conversion for pick and place heads, comprising at least one auto pitch station for adjusting a pitch in a X-coordinate direction and/or adjusting a pitch in a Y-coordinate direction of pickers/grippers of a pick and place heads; a first actuator, operated by a motor gear assembly of the at least one auto pitch station, wherein the first actuator changes the pitch in the X-coordinate direction distance between rows of pickers/grippers of the respective…
System and method for defect detection and photoluminescence measurement of a sample
Granted: September 26, 2017
Patent Number:
9772289
Defect detection and photoluminescence measurement of a sample directing a beam of oblique-illumination wavelength light onto a portion of the sample, directing a beam of normal-illumination wavelength light for causing one or more photoluminescing defects of the sample to emit photoluminescent light onto a portion of the sample, collecting defect scattered radiation or photoluminescence radiation from the sample, separating the radiation from the sample into a first portion of radiation…
Method and system for generating a light-sustained plasma in a flanged transmission element
Granted: September 26, 2017
Patent Number:
9775226
A system for forming a light-sustained plasma capable of emitting vacuum ultraviolet light includes an illumination source configured to generate illumination, a plasma cell including a transmission element having one or more openings, one or more flanges disposed at the openings of the transmission element and configured to enclose the internal volume of the transmission element in order to contain a volume of gas within the plasma cell. The system further includes a collector element…
Apparatus and methods for combined brightfield, darkfield, and photothermal inspection
Granted: September 26, 2017
Patent Number:
9772297
Disclosed are methods and apparatus for detecting defects or reviewing defects in a semiconductor sample. The system has a brightfield (BF) module for directing a BF illumination beam onto a sample and detecting an output beam reflected from the sample in response to the BF illumination beam. The system has a modulated optical reflectance (MOR) module for directing a pump and probe beam to the sample and detecting a MOR output beam from the probe spot in response to the pump beam and the…
Semiconductor inspection and metrology system using laser pulse multiplier
Granted: September 19, 2017
Patent Number:
9768577
A pulse multiplier includes a beam splitter and one or more mirrors. The beam splitter receives a series of input laser pulses and directs part of the energy of each pulse into a ring cavity. After circulating around the ring cavity, part of the pulse energy leaves the ring cavity through the beam splitter and part of the energy is recirculated. By selecting the ring cavity optical path length, the repetition rate of an output series of laser pulses can be made to be a multiple of the…
Scanning electron microscope and methods of inspecting and reviewing samples
Granted: September 19, 2017
Patent Number:
9767986
A scanning electron microscope incorporates a multi-pixel solid-state electron detector. The multi-pixel solid-state detector may detect back-scattered and/or secondary electrons. The multi-pixel solid-state detector may incorporate analog-to-digital converters and other circuits. The multi-pixel solid state detector may be capable of approximately determining the energy of incident electrons and/or may contain circuits for processing or analyzing the electron signals. The multi-pixel…
Outlier detection on pattern of interest image populations
Granted: September 19, 2017
Patent Number:
9767548
Methods and systems for identifying outliers in multiple instances of a pattern of interest (POI) are provided. One system includes one or more computer subsystems configured for acquiring images generated by an imaging subsystem at multiple instances of a POI within a die formed on the specimen. The multiple instances include two or more instances that are located at aperiodic locations within the die. The computer subsystem(s) are also configured for determining a feature of each of…
Repeater detection
Granted: September 19, 2017
Patent Number:
9766187
Systems and methods for detecting defects on a wafer are provided. One method includes generating test image(s) for at least a portion of an array region in die(s) on a wafer from frame image(s) generated by scanning the wafer with an inspection system. The method also includes generating a reference image for cell(s) in the array region from frame images generated by the scanning of the wafer. In addition, the method includes determining difference image(s) for at least one cell in the…
Array mode repeater detection
Granted: September 19, 2017
Patent Number:
9766186
Systems and methods for detecting defects on a wafer are provided. One method includes generating test image(s) for at least a portion of an array region in die(s) on a wafer from frame image(s) generated by scanning the wafer with an inspection system. The method also includes generating a reference image for cell(s) in the array region from frame images generated by the scanning of the wafer. In addition, the method includes determining difference image(s) for at least one cell in the…
Block-to-block reticle inspection
Granted: September 19, 2017
Patent Number:
9766185
Block-to-block reticle inspection includes acquiring a swath image of a portion of a reticle with a reticle inspection sub-system, identifying a first occurrence of a block in the swatch image and at least a second occurrence of the block in the swath image substantially similar to the first occurrence of the block and determining at least one of a location, one or more geometrical characteristics of the block and a spatial offset between the first occurrence of the block and the at…
In-situ metrology
Granted: September 12, 2017
Patent Number:
9760020
Metrology methods and systems are provided, which measure metrology targets during the exposure stage using reflected or diffracted exposure illumination or additional simultaneous illumination having longer wavelengths than the exposure illumination. The metrology measurements are used to correct the lithographic process in a short loop, enabling realtime and even predictive error correction. The metrology methods, tools and systems also include defect detection during the exposure…
Particle and chemical control using tunnel flow
Granted: September 12, 2017
Patent Number:
9759912
An apparatus for contaminant control, having: a first optical assembly including: a first light homogenizer tunnel with: a first end connected to an extreme ultra-violet light source, a second end in communication with a destination chamber, a first enclosed space, and, a first gas input arranged to introduce a first gas such that the first gas flows in a first direction toward the first end and in a second direction toward the second end. The apparatus alternately having: a second…
Variable image field curvature for object inspection
Granted: September 5, 2017
Patent Number:
9752992
Field curvature of an optical system is modified based on topography of the surface of a wafer such that an image of each of the segments of the surface is in focus across the segment. The wafer may be non-planar. The optical system may be a multi-element lens system connected to a controller that modifies the field curvature by changing position of the lens elements. The wafer may be held by a chuck, such as an edge grip chuck. Multiple optical systems may be arranged across a dimension…
High damage threshold frequency conversion system
Granted: September 5, 2017
Patent Number:
9753352
The present invention includes a fundamental laser light source configured to generate fundamental wavelength laser light, a first nonlinear optical crystal configured to generate first alternate wavelength light, a second nonlinear optical crystal configured to generate second alternate wavelength light, a set of Brewster angle wavefront processing optics configured to condition the first and second alternate wavelengths of light, and a harmonic separator configured to receive the first…
