Mattson Technology Profile

Mattson Technology Patent Grants

Controlling azimuthal uniformity of etch process in plasma processing chamber

Patent Number 10297457 - May 21, 2019

Apparatus, systems, and methods for controlling azimuthal uniformity of an etch process in a plasma processing chamber are provided. In one…

Surface treatment of carbon containing films using organic radicals

Patent Number 10269574 - April 23, 2019

Surface treatment processes for treating a workpiece with organic radicals are provided. In one example implementation, a method for…

Pre-heat processes for millisecond anneal system

Patent Number 10262873 - April 16, 2019

Preheat processes for a millisecond anneal system are provided. In one example implementation, a heat treatment process can include receiving…

Substrate breakage detection in a thermal processing system

Patent Number 10242894 - March 26, 2019

Apparatus, systems, and processes for substrate breakage detection in a thermal processing system are provided. In one example implementation,…

Surface treatment of substrates using passivation layers

Patent Number 10217626 - February 26, 2019

Processes and apparatuses for the treatment of semiconductor workpieces are provided. In some embodiments, a method can include placing the…

Mattson Technology Patent Applications

System and Method for Protection of Vacuum Seals in Plasma Processing Systems

Application Number 20160013025 - January 14, 2016

Systems and methods for protecting vacuum seals in a plasma processing system are provided. The processing system can include a vacuum chamber…

APPARATUS AND METHODS FOR GENERATING ELECTROMAGNETIC RADIATION

Application Number 20150035436 - February 5, 2015

An apparatus for generating electromagnetic radiation includes an envelope, a vortex generator configured to generate a vortexing flow of…

Heating Configuration for Use in Thermal Processing Chambers

Application Number 20140246422 - September 4, 2014

An apparatus for heat treating semiconductor wafers is disclosed. The apparatus includes a heating device which contains an assembly linear…

LOW COST HIGH THROUGHPUT PROCESSING PLATFORM

Application Number 20140151195 - June 5, 2014

As part of a system for processing workpieces, a workpiece support arrangement, separate from a process chamber arrangement supports at least…

METHODS, APPARATUS AND MEDIA FOR DETERMINING A SHAPE OF AN IRRADIANCE PULSE TO WHICH A WORKPIECE IS TO BE EXPOSED

Application Number 20130306871 - November 21, 2013

A method and system for determining a shape of an irradiance pulse to which a semiconductor wafer is to be exposed during a thermal cycle are…