Workpiece processing apparatus with thermal processing systems
Patent Number 12183558 - December 31, 2024
An apparatus for combining plasma processing and thermal processing of a workpiece is presented. The apparatus includes a processing chamber,…
Control system for adaptive control of a thermal processing system
Patent Number 12174616 - December 24, 2024
A control system operable to train a control tuner to generate temperature setpoint tracking improvements for a thermal processing system is…
Cooled shield for ICP source
Patent Number 12159770 - December 3, 2024
Provided is a plasma processing apparatus or system including a plasma chamber and an inductively coupled plasma source. A shielding device is…
Atomic layer etch process using plasma in conjunction with a rapid thermal activation process
Patent Number 12159789 - December 3, 2024
A process for etching a film layer on a semiconductor wafer is disclosed. The process is particularly well suited to etching carbon containing…
Post etch defluorination process
Patent Number 12148608 - November 19, 2024
Defluorination processes for removing fluorine residuals from a workpiece such as a semiconductor wafer are provided. In one example…
System and Method for Protection of Vacuum Seals in Plasma Processing Systems
Application Number 20160013025 - January 14, 2016
Systems and methods for protecting vacuum seals in a plasma processing system are provided. The processing system can include a vacuum chamber…
APPARATUS AND METHODS FOR GENERATING ELECTROMAGNETIC RADIATION
Application Number 20150035436 - February 5, 2015
An apparatus for generating electromagnetic radiation includes an envelope, a vortex generator configured to generate a vortexing flow of…
Heating Configuration for Use in Thermal Processing Chambers
Application Number 20140246422 - September 4, 2014
An apparatus for heat treating semiconductor wafers is disclosed. The apparatus includes a heating device which contains an assembly linear…
LOW COST HIGH THROUGHPUT PROCESSING PLATFORM
Application Number 20140151195 - June 5, 2014
As part of a system for processing workpieces, a workpiece support arrangement, separate from a process chamber arrangement supports at least…
METHODS, APPARATUS AND MEDIA FOR DETERMINING A SHAPE OF AN IRRADIANCE PULSE TO WHICH A WORKPIECE IS TO BE EXPOSED
Application Number 20130306871 - November 21, 2013
A method and system for determining a shape of an irradiance pulse to which a semiconductor wafer is to be exposed during a thermal cycle are…
Mattson Technology, Inc. v. Applied Materials, Inc. et al
California Northern District Court - November 22, 2023
Plaintiff v. Defendant
Texas Western District Court - September 2, 2016
Plaintiff v. Defendant
Texas Western District Court - August 30, 2016
Talbert v. Mattson Technology, Inc. et al
California Northern District Court - February 18, 2016
Plaintiff v. Defendant
Texas Western District Court - April 2, 2009
Mattson Technology, Inc. v. Applied Materials, Inc. et al
California California Northern District Court - July 25, 2024
ORDER Granting in Part and Denying in Part 56 , 59 and 87 Motions to Dismiss and Strike. If Mattson elects to file an amended complaint, it…
Mattson Technology, Inc. v. Applied Materials, Inc.
California Court of Appeal - November 20, 2023
Mattson Technology, Inc. v. Applied Materials, Inc.
California Court of Appeal - November 1, 2023
