Nanometrics Profile

Nanometrics Patent Grants

Correction of angular error of plane-of-incidence azimuth of optical metrology device

Patent Number 10296554 - May 21, 2019

Optical metrology is used to calibrate the plane-of-incidence (POI) azimuth error by determining and correcting an azimuth angle offset. The…

Scanning white-light interferometry system for characterization of patterned semiconductor features

Patent Number 10288408 - May 14, 2019

A white light interferometric metrology device operates in the image plane and objective pupil plane. The interferometric metrology device…

Deconvolution to reduce the effective spot size of a spectroscopic optical metrology device

Patent Number 10274367 - April 30, 2019

The effective spot size of a spectroscopic metrology device is reduced through deconvolution of a measurement spectra set acquired from a…

Via characterization for BCD and depth metrology

Patent Number 10254110 - April 9, 2019

An optical metrology device determines physical characteristics of at least one via in a sample, such as a through-silicon vias (TSV), using…

Image based overlay measurement with finite gratings

Patent Number 10107621 - October 23, 2018

An image based overlay measurement is performed using an overlay target that includes shifted overlying gratings. The overlay target is imaged…

Nanometrics Patent Applications

FOCUSING SYSTEM WITH FILTER FOR OPEN OR CLOSED LOOP CONTROL

Application Number 20150168290 - June 18, 2015

An optical metrology device, such as an ellipsometer, includes a focusing system that adjusts the focal position of the metrology device in…

OPTICAL METROLOGY WITH MULTIPLE ANGLES OF INCIDENCE AND/OR AZUMITH ANGLES

Application Number 20150153165 - June 4, 2015

An optical metrology device simultaneously detects light with multiple angles of incidence (AOI) and/or multiple azimuth angles to determine…

OPTICAL METROLOGY SYSTEM FOR SPECTRAL IMAGING OF A SAMPLE

Application Number 20150146193 - May 28, 2015

An optical metrology device is capable of detection of any combination of photoluminescence light, specular reflection of broadband light, and…

ELLIPSOMETER FOCUSING SYSTEM

Application Number 20140098369 - April 10, 2014

An ellipsometer includes an integrated focusing system with a beam splitter between the sample and the ellipsometer detector. The beam…

DARK FIELD DIFFRACTION BASED OVERLAY

Application Number 20130278942 - October 24, 2013

A dark field diffraction based overlay metrology device illuminates an overlay target that has at least three pads for an axis, the three pads…

Nanometrics Federal District Court Decisions

Nanometrics, Incorporated v. Optical Solutions, Inc.

California Northern District Court - March 5, 2019

ORDER GRANTING 43 MOTION TO DISMISS WITH LEAVE TO AMEND. Amended Complaint by OSI due 4/1/2019. Signed by Judge Beth Labson Freeman on…

Nanometrics Incorporated v. Nova Measuring Instruments Ltd. et al

California Northern District Court - October 24, 2006

SUPPLEMENTAL ORDER TO ORDER SETTING INITIAL CASE MANAGEMENT CONFERENCE re 7 Clerks Notice. Signed by Judge William Alsup on 4/18/06. (dt,…