PREDICTIVE METRICS
Filed: October 23, 2006
Metrology products for optimizing manufacturing processes through the science of measurement
Serial Number: 76668127
Classification: Electrical and scientific apparatus
Status: Abandoned - Express
Status Date: 2007-04-24
N,K EXPERT
Filed: September 28, 2004
Software expert system for the automatic analysis of optical data, e;g;, reflectometry, ellipsometry, scatterometry, or any combination thereof, to determine film thicknesses and/or optical constants of materials; It is applicable to single films or multiple-film stacks on any sample
Serial Number: 76613111
Classification: Electrical and scientific apparatus
Status: Abandoned-Failure To Respond Or Late Response
Status Date: 2005-11-25
ATLAS
Filed: October 14, 2003
Metrology equipment that employs polarized, normal incidence spectroscopic ellipsometry for linewidth profile and critical dimensions, spectroscopic reflectometry for films and film stacks, ultraviolet (UV) and deep UV spectroscopic ellipsometry for ultra-thin films and film characterization, diffraction-based overlay and film stress/bow measurement
Serial Number: 76551346
Registration Number: 2909975
Classification: Electrical and scientific apparatus
Status: Section 8 & 15-Accepted And Acknowledged
Status Date: 2011-01-29
NANOCLP
Filed: November 8, 2002
Laser scanners and reflectometers for industrial inspection, namely metrology modules employing optical measuring techniques, particularly reflectometry and laser profiling to non-destructively monitor the surface profiles of samples of semiconductor wafers, flat panel displays and magnetic media
Serial Number: 76466035
Classification: Electrical and scientific apparatus
Status: Abandoned - No Statement Of Use Filed
Status Date: 2004-03-10
OCDSE
Filed: August 26, 2002
Combination of optical metrology instruments for measuring such things as microscopic dimensions and film thickness features of samples, particularly, of semiconductor wafers, flat panel displays and magnetic media
Serial Number: 76444643
Classification: Electrical and scientific apparatus
Status: Abandoned - No Statement Of Use Filed
Status Date: 2003-12-18
NANOUDI
Filed: August 20, 2002
Metrology system for the detection and measurement of particles and defects comprised principally of low distortion optics, a high intensity broadband light source, high resolution detector, and image processing and defect detection software, that enables inspection of both the front and backside of a sample, particularly, a semiconductor wafer, mask, flat panel display, or magnetic substrate
Serial Number: 76442279
Classification: Electrical and scientific apparatus
Status: Abandoned - No Statement Of Use Filed
Status Date: 2004-01-09
NANOOCS
Filed: April 2, 2002
Overlay optical metrology systems comprised of measurement optics, wafer handling mechanisms and system control hardware and software for measuring the difference between two nearly coincident patterns on a sample, such as a semiconductor wafer, which patterns are formed by a process such as photolithography, and which patterns are overlaid, one on top of the other and the overlay difference or error may be fed back to the exposure system that created the patterns so that this difference…
Serial Number: 76391052
Classification: Electrical and scientific apparatus
Status: Abandoned - No Statement Of Use Filed
Status Date: 2003-08-12
NANOOCD
Filed: September 28, 2001
OPTICAL METROLOGY INSTRUMENT USED TO MEASURE MICROSCOPIC FEATURES OF SAMPLES, PARTICULARLY, OF SEMICONDUCTOR WAFERS, FLAT PANEL DISPLAYS AND MAGNETIC MEDIA
Serial Number: 76317800
Registration Number: 2725536
Classification: Electrical and scientific apparatus
Status: Section 8 & 15-Accepted And Acknowledged
Status Date: 2009-05-11
NANOCD
Filed: September 28, 2001
Metrology instrument utilizing an optical technique for measuring microscopic features on samples, such as semiconductor wafers, flat panel displays and magnetic media
Serial Number: 76317801
Classification: Electrical and scientific apparatus
Status: Abandoned - No Statement Of Use Filed
Status Date: 2003-02-28
TNK
Filed: August 23, 2001
Metrology instrument, namely, apparatus for measuring thickness and/or optical properties of films on samples
Serial Number: 76303604
Classification: Electrical and scientific apparatus
Status: Abandoned - No Statement Of Use Filed
Status Date: 2002-11-15
OCD
Filed: August 13, 2001
Metrology instrument utilizing an optical technique for measuring microscopic features on samples, namely, semiconductor wafers, flat panel displays and magnetic media
Serial Number: 76298039
Registration Number: 2811195
Classification: Electrical and scientific apparatus
Status: Section 8 & 15-Accepted And Acknowledged
Status Date: 2009-05-11
NANONET
Filed: August 6, 2001
Computer software for networking two or more metrology instruments together, exchanging files and folders over the network, and providing remote instrument operational status and remote control features for the instruments
Serial Number: 76294267
Registration Number: 2733027
Classification: Electrical and scientific apparatus
Status: Section 8 & 15-Accepted And Acknowledged
Status Date: 2009-02-03
NANOLINE
Filed: May 7, 2001
Electro-optical automatic fine line width metrology apparatus for measuring physical dimensions of features found on samples
Serial Number: 76251587
Registration Number: 2547144
Classification: Electrical and scientific apparatus
Status: Cancelled - Section 8
Status Date: 2008-12-20
INTEGRATED METROLOGY
Filed: June 22, 2000
Thin film and wafer surface measurement and inspection products which are designed to fit inside or be mounted onto production equipment used in the manufacturing of integrated circuits, such as chemical mechanical polishers, chemical vapor deposition systems, and other related equipment
Serial Number: 76075179
Registration Number: 2657329
Classification: Electrical and scientific apparatus
Status: Section 8-Accepted
Status Date: 2009-03-25
INTOOL
Filed: May 10, 1999
Metrology and inspection systems for integration into semiconductor wafer, magnetic read-write head, and flat panel display processing and related equipment; such as, but not limited to, chemical mechanical polishers, chemical vapor deposition reactors, physical vapor deposition reactors, rapid thermal processors, wet and dry etchers, epitaxial reactors, ion implanters, material handlers, lithography track and exposure systems, and assemblies thereof
Serial Number: 75702212
Classification: Electrical and scientific apparatus
Status: Abandoned-Failure To Respond Or Late Response
Status Date: 2000-07-21
MEASURE THIS
Filed: March 22, 1999
MEASUREMENT SYSTEMS FOR THE MICRO-ELECTRONIC INDUSTRIES FOR CRITICAL DIMENSION CONTROL, COMPRISING OPTICAL AND ROBOTIC COMPONENTS, NAMELY, MICROSCOPE LENSES, POLARIZERS, COMPUTER CONTROLLED MECHANICS AND COMPUTER SOFTWARE, FOR THE CONTROL OF ROBOTIC COMPONENTS AND OPTICAL RADIATION ANALYSIS
Serial Number: 75664751
Classification: Electrical and scientific apparatus
Status: Abandoned - No Statement Of Use Filed
Status Date: 2001-02-09
MIGHTYSPEC
Filed: November 23, 1998
A metrology tool for measuring the thickness, and analyzing the composition of certain films such as, but not limited to, polycrystalline films deposited on substrates including, but not limited to, semiconductor wafers, flat panel display substrates and magnetic head substrates, such film properties are determined by various methods such as, but not limited to, reflectometry, ellipsometry and interferometry
Serial Number: 75593732
Classification: Electrical and scientific apparatus
Status: Abandoned - No Statement Of Use Filed
Status Date: 2000-06-29
METRASPEC
Filed: August 25, 1998
Scientific measuring instrument used to measure critical dimensions, lithography overlay registration, film thickness, and analysis of film composition during microelectronics manufacturing such as the production of integrated circuits
Serial Number: 75542214
Classification: Electrical and scientific apparatus
Status: Abandoned - No Statement Of Use Filed
Status Date: 2000-05-24
EPIC
Filed: May 18, 1998
Metrology system for the analysis and determination of properties such as thickness and optical constants of films on samples such as semiconductor wafers using different optical technologies for film analysis such as Fourier Transform Infrared (FTIR), visible and ultraviolet (UV) reflectometry
Serial Number: 75486723
Classification: Electrical and scientific apparatus
Status: Abandoned-Failure To Respond Or Late Response
Status Date: 2000-02-29
NANOMETRA
Filed: March 6, 1998
Scientific instrument for metrology applications, namely, a metrology unit which is used to measure the critical dimensions and overlay registration achieved in submicron optical lithography
Serial Number: 75446145
Classification: Electrical and scientific apparatus
Status: Abandoned - No Statement Of Use Filed
Status Date: 2000-08-02
