Laser scanning apparatus and methods for thermal processing
Granted: September 9, 2004
Application Number:
20040173585
Apparatus and methods for thermally processing a substrate with scanned laser radiation are disclosed. The apparatus includes a continuous radiation source and an optical system that forms an image on a substrate. The image is scanned relative to the substrate surface so that each point in the process region receives a pulse of radiation sufficient to thermally process the region.
Method and apparatus for determining best focus using dark-field imaging
Granted: July 29, 2004
Application Number:
20040145671
A method and apparatus (10) for determining a best focus position of an object (30) relative to a reference position (e.g., axis A) of a dark-field optical imaging system (20), with an effective focusing range up to 10 times of the depth of field of the system. The method includes the steps of first forming a dark-field image of the object at different focus positions (zm). Each dark-field image has a corresponding image intensity distribution with an average intensity and a variance of…
Imaging stabilization apparatus and method for high-performance optical systems
Granted: April 22, 2004
Application Number:
20040074895
An image stabilization apparatus and method for stabilizing the imaging of a high-performance optical system prone to imaging instabilities from thermal effects. Thermal instabilities within the lens, such as convection, can result in image placement errors in a high-performance optical system. The apparatus includes a heating element arranged on the upper surface of the optical system to provide heat to one or more gas-filled spaces in the optical system. An insulating blanket covers a…
Radiation shield device and method
Granted: March 4, 2004
Application Number:
20040041105
A radiation shield device (100) and method, the apparatus comprising either an absorbing shield (130), a scattering shield (200) or an absorbing and scattering shield (300) arranged in a processing tool (50) that irradiates a workpiece (70) with high-irradiance radiation (80) from a light source (78). The processing tool has a tool portion (66) having an irradiance damage threshold (IDT). The radiation shield device is designed to intercept a portion of the high-irradiance radiation that…
Thermally induced reflectivity switch for laser thermal processing
Granted: February 21, 2002
Application Number:
20020022294
A method, apparatus and system for controlling the amount of heat transferred to a process region (30) of a workpiece (W) from exposure with laser radiation (10) using a thermally induced reflectivity switch layer (60). The apparatus of the invention is a film stack (6) having an absorber layer (50) deposited atop the workpiece, such as a silicon wafer. A portion of the absorber layer covers the process region. The absorber layer absorbs laser radiation and converts the absorbed…
Thermally induced reflectivity switch for laser thermal processing
Granted: February 14, 2002
Application Number:
20020019148
A method, apparatus and system for controlling the amount of heat transferred to a process region (30) of a workpiece (W) from exposure with laser radiation (10) using a thermally induced reflectivity switch layer (60). The apparatus of the invention is a film stack (6) having an absorber layer (50) deposited atop the workpiece, such as a silicon wafer. A portion of the absorber layer covers the process region. The absorber layer absorbs laser radiation and converts the absorbed…
