Dual-column-parallel CCD sensor and inspection systems using a sensor
Granted: September 1, 2020
Patent Number:
10764527
A dual-column-parallel image CCD sensor utilizes a dual-column-parallel readout circuit including two pairs of cross-connected transfer gates to alternately transfer pixel data (charges) from a pair of adjacent pixel columns to a shared output circuit at high speed with low noise. Charges transferred along the two adjacent pixel columns at a line clock rate are alternately passed by the transfer gates to a summing gate that is operated at twice the line clock rate to pass the image…
Recipe optimization based zonal analysis
Granted: September 1, 2020
Patent Number:
10763146
Metrology methods and modules are provided, which comprise carrying out recipe setup procedure(s) and/or metrology measurement(s) using zonal analysis with respect to respective setup parameter(s) and/or metrology metric(s). The zonal analysis comprises relating to spatially variable values of the setup parameter(s) and/or metrology metric(s) across one or more wafers in one or more lots. Wafer zones may be discrete or spatially continuous, and be used to weight one or more parameter(s)…
Methods and systems for inline parts average testing and latent reliability defect detection
Granted: September 1, 2020
Patent Number:
10761128
Methods and systems for inline parts average testing and latent reliability defect recognition or detection are disclosed. An inline parts average testing method may include: performing inline inspection and metrology on a plurality of wafers at a plurality of critical steps during wafer fabrication; aggregating inspection results obtained from inline inspection and metrology utilizing one or more processors to obtain a plurality of aggregated inspection results for the plurality of…
Expediting spectral measurement in semiconductor device fabrication
Granted: September 1, 2020
Patent Number:
10761034
A device and method for expediting spectral measurement in metrological activities during semiconductor device fabrication through interferometric spectroscopy of white light illumination during calibration, overlay, and recipe creation.
Arbitrary wavefront compensator for deep ultraviolet (DUV) optical imaging system
Granted: September 1, 2020
Patent Number:
10761031
Disclosed is a system that includes a light source for generating an illumination beam and an illumination lens system for directing the illumination beam towards a sample. The system further includes a collection lens system for directing towards a detector output light from the sample in response to the illumination beam and a detector for receiving the output light from the sample. The collection lens system includes a fixed-design compensator plate having individually selectable…
Diffraction-based focus metrology
Granted: September 1, 2020
Patent Number:
10761023
Diffraction-based focus target cells, targets and design and measurement methods are provided, which enable sensitive focus measurements to be carried out by overlay measurement tools. Cells comprise a periodic structure having a coarse pitch and multiple elements arranged at a fine pitch. The coarse pitch is an integer multiple of the fine pitch, with the fine pitch being between one and two design rule pitches and smaller than a measurement resolution and the coarse pitch being larger…
Rotated boundaries of stops and targets
Granted: September 1, 2020
Patent Number:
10761022
A scatterometry metrology system, configured to measure diffraction signals from at least one target having respective at least one measurement direction, the scatterometry metrology system having at least one field stop having edges which are slanted with respect to the at least one measurement direction.
Reticle optimization algorithms and optimal target design
Granted: August 25, 2020
Patent Number:
10754261
Metrology target designs on the reticle and on the wafer, and target design and processing methods are provided. Target designs comprise coarse pitched periodic structures having fine pitched sub-elements, which vary in sub-element CD and/or height, an orthogonal periodic structure, perpendicular to the measurement direction, with an orthogonal unresolved pitch among periodically recurring bars, which provide a calibration parameter for achieving well-printed targets. Orthogonal periodic…
Reflection-mode electron-beam inspection using ptychographic imaging
Granted: August 25, 2020
Patent Number:
10755892
A particle-beam inspection system may include a reflective particle-beam imaging system providing an image of a selected portion of a sample and a diffraction pattern of the selected portion of the sample and a controller communicatively coupled to the reflective particle-beam imaging system. The controller may receive two or more sample-plane images from the reflective particle-beam imaging system associated with two or more selected portions of the sample, where at least some of the…
Hot spot and process window monitoring
Granted: August 25, 2020
Patent Number:
10755016
Metrology overlay targets are provided, as well as method of monitoring process shortcomings. Targets comprise periodic structures, at least one of which comprising repeating asymmetric elements along a corresponding segmentation direction of the periodic structure. The asymmetry of the elements may be designed in different ways, for example as repeating asymmetric sub-elements along a direction perpendicular to the segmentation direction of the elements. The asymmetry of the…
Method and system for process control with flexible sampling
Granted: August 25, 2020
Patent Number:
10754260
The generation of flexible sparse metrology sample plans includes receiving a full set of metrology signals from one or more wafers from a metrology tool, determining a set of wafer properties based on the full set of metrology signals and calculating a wafer property metric associated with the set of wafer properties, calculating one or more independent characterization metrics based on the full set of metrology signals, and generating a flexible sparse sample plan based on the set of…
Deflection array apparatus for multi-electron beam system
Granted: August 18, 2020
Patent Number:
10748739
An optical characterization system utilizing a micro-lens array (MLA) is provided. The system may include an electron source and a MLA including a micro-deflection array (MDA). The MDA may include an insulator substrate and a plurality of hexapole electrostatic deflectors disposed on the insulator substrate. The MDA may further include a plurality of voltage connecting lines configured to electrically couple the plurality of hexapole electrostatic deflectors to one or more voltage…
Electron beam generation and measurement
Granted: August 18, 2020
Patent Number:
10748737
A flat top laser beam is used to generate an electron beam with a photocathode that can include an alkali halide. The flat top profile can be generated using an optical array. The laser beam can be split into multiple laser beams or beamlets, each of which can have the flat top profile. A phosphor screen can be imaged to determine space charge effects or electron energy of the electron beam.
Liquid metal rotating anode X-ray source for semiconductor metrology
Granted: August 18, 2020
Patent Number:
10748736
Methods and systems for realizing a high brightness, liquid based x-ray source suitable for high throughput x-ray metrology are presented herein. A high brightness x-ray source is produced by bombarding a rotating liquid metal anode material with a stream of electrons to generate x-ray radiation. A rotating anode support structure supports the liquid metal anode material in a fixed position with respect to the support structure while rotating at the constant angular velocity. In another…
Photocathode including field emitter array on a silicon substrate with boron layer
Granted: August 18, 2020
Patent Number:
10748730
A photocathode utilizes an field emitter array (FEA) integrally formed on a silicon substrate to enhance photoelectron emissions, and a thin boron layer disposed directly on the output surface of the FEA to prevent oxidation. The field emitters are formed by protrusions having various shapes (e.g., pyramids or rounded whiskers) disposed in a two-dimensional periodic pattern, and may be configured to operate in a reverse bias mode. An optional gate layer is provided to control emission…
Simultaneous multi-directional laser wafer inspection
Granted: August 11, 2020
Patent Number:
10739275
Disclosed is apparatus for inspecting a sample. The apparatus includes illumination optics for simultaneously directing a plurality of incident beams at a plurality of azimuth angles towards a sample and collection optics for directing a plurality of field portions of output light from two or more of the plurality of angles towards two or more corresponding sensors. The two or more sensors are arranged for receiving the field portions corresponding to two or more angles and generating…
Photocathode emitter system that generates multiple electron beams
Granted: August 11, 2020
Patent Number:
10741354
The system includes a photocathode electron source, diffractive optical element, and a microlens array to focus the beamlets. A source directs a radiation beam to the diffractive optical element, which produces a beamlet array to be used in combination with a photocathode surface to generate an array of electron beams from the beamlets.
Computer assisted weak pattern detection and quantification system
Granted: August 11, 2020
Patent Number:
10740888
Methods and systems for providing weak pattern (or hotspot) detection and quantification are disclosed. A weak pattern detection and quantification system may include a wafer inspection tool configured to inspect a wafer and detect defects present on the wafer. The system may also include at least one processor in communication with the wafer inspection tool. The at least one processor may be configured to: perform pattern grouping on the detected defects based on design of the wafer;…
Lens design for spectroscopic ellipsometer or reflectometer
Granted: August 11, 2020
Patent Number:
10739571
A lens system includes a curved primary mirror and an aspheric secondary mirror. The aspheric secondary mirror has a diameter smaller than that of the primary mirror and shares an optical axis with the primary mirror. The aspheric secondary mirror and the primary mirror are rotationally symmetric with respect to the optical axis. A support member, which may be transparent over an operating wavelength of the lens system, is disposed on the aspheric secondary mirror.
Minimizing filed size to reduce unwanted stray light
Granted: August 11, 2020
Patent Number:
10739276
Stray and air scattered light can be reduced by configuring a size of the collection area of a sensor, which reduces a source of sensitivity-limiting noise in the system. By adjusting a size of the collection area, stray deep ultraviolet light and air-scattered deep ultraviolet light can be reduced. A servo can control a position of an illumination spot that is collected by the time delay and integration sensor.
