Laser thermal processing chuck with a thermal compensating heater module
Granted: February 5, 2008
Patent Number:
7326877
Chuck methods and apparatus for supporting a semiconductor substrate and maintaining it at a substantially constant background temperature even when subject to a spatially and temporally varying thermal load. Chuck includes a thermal compensating heater module having a sealed chamber containing heater elements, a wick, and an alkali metal liquid/vapor. The chamber employs heat pipe principles to equalize temperature differences in the module. The spatially varying thermal load is quickly…
COlaser stabilization systems and methods
Granted: November 6, 2007
Patent Number:
7292616
Systems and methods for stabilizing a CO2 laser are disclosed. The system includes a detector unit for measuring the power in a select portion of the output beam. The detector unit generates an electrical signal corresponding to the measured power. The modulation frequency of the signal used to modulate the relatively high-frequency radio-frequency (RF) pump signal is filtered from the electrical signal. The filtered electrical signal is then compared to a desired value for the output…
Methods and apparatus for truncating an image formed with coherent radiation
Granted: August 7, 2007
Patent Number:
7253376
Methods and apparatus for truncating an image formed with coherent radiation. The optical relay system is adapted to form a line image at the image plane. The image is truncated by a variable aperture at or near the aperture plane conjugate to the image plane, to block progressively increasing portions of an incident coherent radiation beam used to form the line image. An apodizing pupil filter having a maximum transmission or reflection in the center and a transmission or reflection…
Methods and apparatus for irradiating a substrate to avoid substrate edge damage
Granted: July 3, 2007
Patent Number:
7238915
Methods and apparatus (100) for scanning a surface (12) of a substrate (10) with an obliquely incident radiation beam (20) over a select scan path (210) to avoid damage (30) to the curved edge (14) of the substrate. The methods and apparatus allow for the substrate edge to be irradiated with the full intensity of the radiation beam, provided that the edge crossing positions avoid a region where the polar angle is less than a scan path critical (SPC) polar angle (?C). At the SPC polar…
Deodorizer for cigarette butt collection containers
Granted: June 19, 2007
Patent Number:
7231924
A deodorizing apparatus for suppressing odor emanating from a cigarette butt containment vessel. The cigarette butt containment vessel includes a partially enclosed basin cavity into which cigarette butts are collected. In accordance with the present invention, the deodorizing apparatus includes an odor absorption device mounted within the basin cavity of the cigarette butt containment vessel. The odor absorption device includes an absorptive material housing constructed of an…
Heat shield for thermal processing
Granted: February 13, 2007
Patent Number:
7176405
A heat shield (10) that facilitates thermally processing a substrate (22) with a radiation beam (150) is disclosed. The heat shield is in the form of a cooled plate adapted to allow the radiation beam to communicate with the substrate upper surface (20) over a radiation beam path (BP), either through an aperture or a transparent region. The heat shield has an operating position that forms a relatively small gap (170) between the lower surface (54) of the heat shield and the upper surface…
Deep ultraviolet unit-magnification projection optical system and projection exposure apparatus
Granted: February 13, 2007
Patent Number:
7177099
A 1× projection optical system for deep ultra-violet (DUV) photolithography is disclosed. The optical system is a modified Dyson system capable of imaging a relatively large field at high numerical apertures at DUV wavelengths. The optical system includes a lens group having first and second prisms and four lenses having a positive-negative-positive negative arrangement as arranged in order from the prisms toward the mirror. A projection photolithography system that employs the…
Laser scanning apparatus and methods for thermal processing
Granted: January 2, 2007
Patent Number:
7157660
Apparatus and methods for thermally processing a substrate with scanned laser radiation are disclosed. The apparatus includes a continuous radiation source and an optical system that forms an image on a substrate. The image is scanned relative to the substrate surface so that each point in the process region receives a pulse of radiation sufficient to thermally process the region.
Laser scanning apparatus and methods for thermal processing
Granted: December 26, 2006
Patent Number:
7154066
Apparatus and methods for thermally processing a substrate with scanned laser radiation are disclosed. The apparatus includes a continuous radiation source and an optical system that forms an image on a substrate. The image is scanned relative to the substrate surface so that each point in the process region receives a pulse of radiation sufficient to thermally process the region.
Apochromatic unit-magnification projection optical system
Granted: December 12, 2006
Patent Number:
7148953
A projection optical system suitable for projection photolithography is disclosed. The projection optical system is a modified Wynne-Dyson system capable of imaging a large field over both a narrow and a broad spectral range. The projection optical system includes a positive lens group arranged adjacent to but spaced apart from a concave mirror along the mirror axis on the concave side of the mirror. The system also includes a variable aperture stop so that the system has a variable NA.…
Laser thermal annealing of lightly doped silicon substrates
Granted: December 12, 2006
Patent Number:
7148159
Apparatus and method for performing laser thermal annealing (LTA) of a substrate using an annealing radiation beam that is not substantially absorbed in the substrate at room temperature. The method takes advantage of the fact that the absorption of long wavelength radiation (1 micron or greater) in some substrates, such as undoped silicon substrates, is a strong function of temperature. The method includes heating the substrate to a critical temperature where the absorption of…
Silicon layer for uniformizing temperature during photo-annealing
Granted: December 5, 2006
Patent Number:
7145104
An apparatus and method for uniformizing the temperature distribution across a semiconductor wafer during radiation annealing of process regions formed in the wafer is disclosed. The method includes forming a silicon layer atop the upper surface of the wafer and irradiating the layer with one or more pulses of radiation having wavelengths that are substantially absorbed by the silicon layer. The silicon layer acts to uniformly absorb the one or more radiation pulses and then transfers…
High NA large-field unit-magnification projection optical system
Granted: October 3, 2006
Patent Number:
7116496
An optical system for projection photolithography is disclosed. The optical system is a modified Dyson system capable of imaging a large field over both a narrow and a broad spectral range. The optical system includes a positive lens group having a positive subgroup of elements that includes at least a plano-convex element and a negative subgroup that includes at least a negative meniscus element. The lens subgroups are separated by a small air space. The positive and negative subgroups…
Laser thermal annealing of lightly doped silicon substrates
Granted: August 29, 2006
Patent Number:
7098155
Apparatus and method for performing laser thermal annealing (LTA) of a substrate using an annealing radiation beam that is not substantially absorbed in the substrate at room temperature. The method takes advantage of the fact that the absorption of long wavelength radiation (1 micron or greater) in some substrates, such as undoped silicon substrates, is a strong function of temperature. The method includes heating the substrate to a critical temperature where the absorption of…
Method and apparatus for determining best focus using dark-field imaging
Granted: August 22, 2006
Patent Number:
7095904
A method and apparatus (10) for determining a best focus position of an object (30) relative to a reference position (e.g., axis A) of a dark-field optical imaging system (20), with an effective focusing range up to 10 times of the depth of field of the system. The method includes the steps of first forming a dark-field image of the object at different focus positions (zm). Each dark-field image has a corresponding image intensity distribution with an average intensity and a variance of…
Beamsplitter for high-power radiation
Granted: May 23, 2006
Patent Number:
7049544
A beamsplitter apparatus for use with high-power radiation is disclosed. The apparatus includes a thermally conductive frame with a central aperture. The frame holds a window in the central aperture at the window's periphery. The window includes a diamond substrate with an optional coating formed thereon. Because the substrate is diamond and the frame is thermally conductive, the window is less susceptible to thermal effects caused by absorption of the incident radiation by the window.…
Imaging stabilization apparatus and method for high-performance optical systems
Granted: January 24, 2006
Patent Number:
6989515
An image stabilization apparatus and method for stabilizing the imaging of a high-performance optical system prone to imaging instabilities from thermal effects. Thermal instabilities within the lens, such as convection, can result in image placement errors in a high-performance optical system. The apparatus includes a heating element arranged on the upper surface of the optical system to provide heat to one or more gas-filled spaces in the optical system. An insulating blanket covers a…
Machine-independent alignment system and method
Granted: May 24, 2005
Patent Number:
6898306
A method of measuring machine alignment offset of an optical machine having an alignment system, so that subsequent processing of substrates on set of optical machines can be performed in a machine-independent manner. The optical machine forms overlayed images of first and second patterns formed on either one or two reticles onto a substrate at respective first and second levels. The method of the invention includes forming a virtual zero-offset alignment pattern and a virtual…
Large-field unit-magnification projection system
Granted: April 12, 2005
Patent Number:
6879383
An optical system for projection photolithography is disclosed. The optical system is a modified Dyson system capable of imaging a large field over a broad spectral range. The optical system includes a positive lens group having three elements: a plano-convex element and two negative meniscus elements. The lens group is arranged adjacent to but spaced apart from a concave mirror along the mirror axis. A projection photolithography system that employs the optical system is also disclosed.
Method and apparatus for masking a workpiece with ink
Granted: March 22, 2005
Patent Number:
6869155
A method and apparatus for masking a workpiece with a layer of ink from an inkjet head is disclosed. The masking prevents exposure of select regions of a photosensitive workpiece. The apparatus includes a workpiece pre-aligner for movably supporting and aligning the workpiece. The inkjet head is arranged to be in operable communication with the photosensitive layer of the workpiece when positioned on the pre-aligner and is adapted for providing a select mask of opaque ink on a…
