Shielded gate trench (SGT) mosfet devices and manufacturing processes
Granted: February 24, 2015
Patent Number:
8963240
This invention discloses a semiconductor power device that includes a plurality of power transistor cells surrounded by a trench opened in a semiconductor substrate. At least one of the cells constituting an active cell has a source region disposed next to a trenched gate electrically connecting to a gate pad and surrounding the cell. The trenched gate further has a bottom-shielding electrode filled with a gate material disposed below and insulated from the trenched gate. At least one of…
Power MOSFET device structure for high frequency applications
Granted: February 24, 2015
Patent Number:
8963233
This invention discloses a new switching device that includes a drain disposed on a first surface and a source region disposed near a second surface of a semiconductor opposite the first surface. An insulated gate electrode is disposed on top of the second surface for controlling a source to drain current and a source electrode is interposed into the insulated gate electrode for substantially preventing a coupling of an electrical field between the gate electrode and an epitaxial region…
Oxide terminated trench MOSFET with three or four masks
Granted: February 17, 2015
Patent Number:
8956940
An oxide termination semiconductor device may comprise a plurality of gate trenches, a gate runner, and an insulator termination trench. The gate trenches are located in an active region. Each gate trench includes a conductive gate electrode. The insulator termination trench is located in a termination region that surrounds the active region. The insulator termination trench is filled with an insulator material to form an insulator termination for the semiconductor device. Source and…
Average inductor current mode voltage control device and method
Granted: February 10, 2015
Patent Number:
8952669
An average inductor valley current mode voltage control device for a DC/DC converter comprises a sample-hold inductor valley voltage unit receiving at least two inductor valley currents of at least two consecutive cycles produced by the inductor and then converting the at least two inductor valley currents into an average inductor valley voltage; and a reference voltage generation unit connected to the sample-hold inductor valley voltage unit and a transistor switch of the DC/DC…
Stacked multi-chip bottom source semiconductor device and preparation method thereof
Granted: February 10, 2015
Patent Number:
8952509
The present invention discloses a stacked dual MOSFET package structure and a preparation method thereof. The stacked dual MOSFET package structure comprises a lead frame unit having a die paddle, a first lead and a second lead; a first chip flipped and attached on a top surface of a main paddle of the die paddle; a second chip attached on a bottom surface of the main paddle; and a metal clip mounted on the back of the flipped first chip and electrically connecting an electrode at the…
High density trench-based power MOSFETs with self-aligned active contacts and method for making such devices
Granted: February 10, 2015
Patent Number:
8951867
Aspects of the present disclosure describe a high density trench-based power MOSFET with self-aligned source contacts. The source contacts are self-aligned with a first insulative spacer and a second insulative spacer, wherein the first spacer is resistant to an etching process that will selectively remove the material the second spacer is made from. Additionally, the active devices may have a two-step gate oxide, wherein a lower portion of the gate oxide has a thickness T2 that is…
High frequency switching MOSFETs with low output capacitance using a depletable P-shield
Granted: February 3, 2015
Patent Number:
8946816
Aspects of the present disclosure describe a high density trench-based power MOSFETs with self-aligned source contacts and methods for making such devices. The source contacts are self-aligned with spacers and the active devices may have a two-step gate oxide. A lower portion may have a thickness that is larger than the thickness of an upper portion of the gate oxide. The MOSFETS also may include a depletable shield in a lower portion of the substrate. The depletable shield may be…
Robust semiconductor power devices with design to protect transistor cells with slower switching speed
Granted: February 3, 2015
Patent Number:
8946942
This invention discloses a power switch that includes a fast-switch semiconductor power device and a slow-switch semiconductor power device controllable to turn on and off a current transmitting therethrough. The slow-switch semiconductor power device further includes a ballasting resistor for increasing a device robustness of the slow switch semiconductor power device. In an exemplary embodiment, the fast-switch semiconductor power device includes a fast switch metal oxide semiconductor…
Diode structures with controlled injection efficiency for fast switching
Granted: January 13, 2015
Patent Number:
8933506
This invention discloses a semiconductor device disposed in a semiconductor substrate. The semiconductor device includes a first semiconductor layer of a first conductivity type on a first major surface. The semiconductor device further includes a second semiconductor layer of a second conductivity type on a second major surface opposite the first major surface. The semiconductor device further includes an injection efficiency controlling buffer layer of a first conductivity type…
Stacked power semiconductor device using dual lead frame
Granted: January 13, 2015
Patent Number:
8933518
A stacked power semiconductor device includes vertical metal oxide semiconductor field-effect transistors and dual lead frames packaged with flip-chip technology. In the method of manufacturing the stacked power semiconductor device, a first semiconductor chip is flip chip mounted on the first lead frame. A mounting clips is connected to the electrode at back side of the first semiconductor chip. A second semiconductor chip is mounted on the second lead frame, which is then flipped and…
Double-side exposed semiconductor device
Granted: January 13, 2015
Patent Number:
8933545
A double-side exposed semiconductor device includes an electric conductive first lead frame attached on top of a thermal conductive but electrical nonconductive second lead frame and a semiconductor chip flipped and attached on top of the first lead frame. The gate and source electrodes on top of the flipped chip form electrical connections with gate and source pins of the first lead frame respectively. The flipped chip and center portions of the first and second lead frames are then…
Dual-leadframe multi-chip package
Granted: January 13, 2015
Patent Number:
8933549
A dual-leadframe multi-chip package comprises a first leadframe with a first die pad, and a second leadframe with a second die pad; a first chip mounted on the first die pad functioning as a high-side MOSFET and second chip mounted on the second die pad functioning as a low-side MOSFET. The package may further comprises a bypass capacity configured as a third chip mounted on the first die pad or integrated with the first chip. The package may further comprise a three-dimensional…
Structure of mixed semiconductor encapsulation structure with multiple chips and capacitors
Granted: January 13, 2015
Patent Number:
8933550
A semiconductor package for power converter application comprises a low-side MOSFET chip and a high-side MOSFET chip stacking one over the other. The semiconductor package may further enclose a capacitor whereas the capacitor may be a discrete component or an integrated component on chip level with the low-side MOSFET. The semiconductor package may further comprise a PIC chip to provide a complete power converter on semiconductor chip assembly package level.
Nanotube semiconductor devices
Granted: January 6, 2015
Patent Number:
8928031
Semiconductor devices are formed using a thin epitaxial layer (nanotube) formed on sidewalls of dielectric-filled trenches. In one embodiment, a semiconductor device is formed in a second semiconductor layer disposed on a first semiconductor layer of opposite conductivity type and having trenches formed therein where the trenches extend from the top surface to the bottom surface of the second semiconductor layer. The semiconductor device includes a first epitaxial layer formed on…
MOS device with low injection diode
Granted: January 6, 2015
Patent Number:
8928079
A semiconductor device is formed on a semiconductor substrate. The device includes: a drain; an epitaxial layer overlaying the drain, wherein a drain region extends into the epitaxial layer; and an active region. The active region includes: a body disposed in the epitaxial layer, having a body top surface; a source embedded in the body, extending from the body top surface into the body; a gate trench extending into the epitaxial layer; a gate disposed in the gate trench; an active region…
Lateral PNP bipolar transistor formed with multiple epitaxial layers
Granted: December 23, 2014
Patent Number:
8916951
A lateral bipolar transistor with deep emitter and deep collector regions is formed using multiple epitaxial layers of the same conductivity type. Deep emitter and deep collector regions are formed without the use of trenches. Vertically aligned diffusion regions are formed in each epitaxial layer so that the diffusion regions merged into a contiguous diffusion region after annealing to function as emitter or collector or isolation structures. In another embodiment, a lateral trench PNP…
Dual gate oxide trench MOSFET with channel stop trench
Granted: December 9, 2014
Patent Number:
8907416
A semiconductor device and fabrication methods are disclosed. The device includes a plurality of gate electrodes formed in trenches located in an active region of a semiconductor substrate. A first gate runner is formed in the substrate and electrically connected to the gate electrodes, wherein the first gate runner surrounds the active region. A second gate runner is connected to the first gate runner and located between the active region and a termination region. A termination…
High voltage fast recovery trench diode
Granted: December 9, 2014
Patent Number:
8907414
Aspects of the present disclosure describe high voltage fast recovery trench diodes and methods for make the same. The device may have trenches that extend at least through a top P-layer and an N-barrier layer. A conductive material may be disposed in the trenches with a dielectric material lining the trenches between the conductive material and sidewalls of the trenches. A highly doped P-pocket may be formed in an upper portion of the top P-layer between the trenches. A floating…
Staggered column superjunction
Granted: December 2, 2014
Patent Number:
8900949
A staggered column superjunction semiconductor device may include a cell region having one or more device cells. One or more device cells in the cell region include a semiconductor substrate configured to act as a drain and a semiconductor layer formed on the substrate. A first doped column may be formed in the semiconductor layer to a first depth and a second doped column may be formed in the semiconductor layer to a second depth. The first depth is greater than the second depth. The…
Structure and method for self protection of power device with expanded voltage ranges
Granted: December 2, 2014
Patent Number:
8900983
A vertical semiconductor power device includes a top surface and a bottom surface of a semiconductor substrate constituting a vertical current path for conducting a current there through. The semiconductor power device further includes an over current protection layer composed of a material having a resistance with a positive temperature coefficient (PTC) and the over current protection layer constituting as a part of the vertical current path connected to a source electrode and…
