Spin-orbit torque MRAM structure and manufacture thereof
Granted: January 14, 2025
Patent Number:
12201030
Embodiments of the present disclosure generally include spin-orbit torque magnetoresistive random-access memory (SOT-MRAM) devices and methods of manufacture thereof. The SOT-MRAM devices described herein include an SOT layer laterally aligned with a magnetic tunnel junction (MTJ) stack and formed over a trench in an interconnect. Thus, the presence of the SOT layer outside the area of the MTJ stack is eliminated, and electric current passes from the interconnect to the SOT layer by…
Physical vapor deposition of piezoelectric films
Granted: January 14, 2025
Patent Number:
12201025
A physical vapor deposition system includes a deposition chamber, a support to hold a substrate in the deposition chamber, a target in the chamber, a power supply configured to apply power to the target to generate a plasma in the chamber to sputter material from the target onto the substrate to form a piezoelectric layer on the substrate, and a controller configured to cause the power supply to alternate between deposition phases in which the power supply applies power to the target and…
Contact over active gate structure
Granted: January 14, 2025
Patent Number:
12198985
Methods of forming and processing semiconductor devices which utilize a three-color hardmask process are described. Certain embodiments relate to the formation of self-aligned contacts for metal gate applications. More particularly, certain embodiments relate to the formation of self-aligned gate contacts through the selective deposition of a fill material.
Substrate support designs for a deposition chamber
Granted: January 14, 2025
Patent Number:
12198967
The present disclosure generally relates to a substrate support that includes a body having a substrate receiving surface, the body comprising a dielectric material. The body also includes a first foil embedded in the body below the substrate receiving surface. The body also includes an electrically conductive mesh embedded in the body below the first foil. The body also includes a center tap structure formed in a bottom surface of the body that is in electrical communication with the…
Substrate support with multiple embedded electrodes
Granted: January 14, 2025
Patent Number:
12198966
A method and apparatus for biasing regions of a substrate in a plasma assisted processing chamber are provided. Biasing of the substrate, or regions thereof, increases the potential difference between the substrate and a plasma formed in the processing chamber thereby accelerating ions from the plasma towards the active surfaces of the substrate regions. A plurality of bias electrodes herein are spatially arranged across the substrate support in a pattern that is advantageous for…
Magnetically coupled RF filter for substrate processing chambers
Granted: January 14, 2025
Patent Number:
12198908
A semiconductor processing chamber for processing semiconductor substrates may include a pedestal to support a substrate with a heater zones and a wire mesh configured to deliver a Radio Frequency (RF) signal to a plasma. The chamber may also include heater zone controls that deliver current to the heater zones and a filter circuit between the heater zone controls and the heater zones. The filter circuit may include inductors on leads from the heater zones and a resonant circuit with a…
Compact low angle ion beam extraction assembly and processing apparatus
Granted: January 7, 2025
Patent Number:
12191117
An extraction assembly may include an extraction plate for placement along a side of a plasma chamber, and having an extraction aperture, elongated along a first direction, and having an aperture height, extending along a second direction, perpendicular to the first direction. The extraction plate defines an inner surface along the extraction aperture, lying in a first plane. A beam blocker is disposed over the extraction aperture, and has an outer surface, disposed in a second plane,…
Controller and control techniques for linear accelerator and ion implanter having linear accelarator
Granted: January 7, 2025
Patent Number:
12193140
An apparatus may include global control module, the global control module including a digital master clock generator and a master waveform generator. The apparatus may also include a plurality of resonator control modules, coupled to the global control module. A given resonator control module of the plurality of resonator control modules may include a synchronization module, having a first input coupled to receive a resonator output voltage pickup signal from a local resonator, a second…
Multilayer coating for corrosion resistance
Granted: January 7, 2025
Patent Number:
12191120
Exemplary methods of coating a metal-containing component are described. The methods are developed to increase corrosion resistance and improve coating adhesion to a metal substrate. The methods include forming a bonding layer on a metal substrate, where the bonding layer includes an oxide of a metal in the metal substrate. The coating methods further include depositing a stress buffer layer on the bonding layer, where the stress buffer layer is characterized by a stress buffer layer…
Monolithic modular microwave source with integrated process gas distribution
Granted: January 7, 2025
Patent Number:
12191118
Embodiments disclosed herein include a housing for a source array. In an embodiment, the housing comprises a conductive body, where the conductive body comprises a first surface and a second surface opposite from the first surface. In an embodiment a plurality of openings are formed through the conductive body and a channel is disposed into the second surface of the conductive body. In an embodiment, a cover is over the channel, and the cover comprises first holes that pass through a…
Pulse train annealing method and apparatus
Granted: January 7, 2025
Patent Number:
12186832
The present invention generally describes apparatuses and methods used to perform an annealing process on desired regions of a substrate. In one embodiment, pulses of electromagnetic energy are delivered to a substrate using a flash lamp or laser apparatus. The pulses may be from about 1 nsec to about 10 msec long, and each pulse has less energy than that required to melt the substrate material. The interval between pulses is generally long enough to allow the energy imparted by each…
Dual RF for controllable film deposition
Granted: January 7, 2025
Patent Number:
12191115
A plasma processing system is described. The system may include a showerhead. The system may further include a first RF generator in electrical communication with the showerhead. The first RF generator may be configured to deliver a first voltage at a first frequency to the showerhead. Additionally, the system may include a second RF generator in electrical communication with a pedestal. The second RF generator may be configured to deliver a second voltage at a second frequency to the…
Systems and methods for optimizing full horizontal scanned beam distance
Granted: January 7, 2025
Patent Number:
12191113
Provided herein are approaches for optimizing a full horizontal scanned beam distance of an accelerator beam. In one approach, a method may include positioning a first Faraday cup along a first side of an intended beam-scan area, positioning a second Faraday cup along a second side of the intended beam-scan area, scanning an ion beam along the first and second sides of the intended beam-scan area, measuring a first beam current of the ion beam at the first Faraday cup and measuring a…
Managing memory leakages of a system for evaluating manufactured items
Granted: January 7, 2025
Patent Number:
12190971
A system for evaluating manufactured items that includes a memory module; an evaluation unit configured to execute instructions related to the evaluating of the manufactured items while applying a group of features; and a memory leakage unit configured to: select a first feature out of the group of features and disable an execution, by the evaluation unit, of instructions associated with the first feature at a presence of a memory leakage event. The first feature has a priority that is…
Diagnostic tool to tool matching and comparative drill-down analysis methods for manufacturing equipment
Granted: January 7, 2025
Patent Number:
12189380
A method includes receiving first data associated with measurements taken by a sensor during a first manufacturing procedure of a manufacturing chamber. The method further includes receiving second data. The second data includes reference data associated with the first data. The method further includes providing the first and second data to a comparison model. The method further includes receiving a similarity score from the comparison model, associated with the first and second data.…
Dynamic scheduling based on task dependencies
Granted: January 7, 2025
Patent Number:
12189375
A method includes determining a plurality of dependencies associated with a plurality of tasks of a substrate processing system. The method further includes generating, based on the plurality of dependencies, a dependency graph of the plurality of tasks. The method further includes topologically sorting the dependency graph to generate one or more outputs. A schedule associated with processing a plurality of substrates in the substrate processing system is based on the one or more…
Digital lithography scan sequencing
Granted: January 7, 2025
Patent Number:
12189299
A digital lithography system includes adjacent scan regions, exposure units located above the scan regions, a memory, and a processing device operatively coupled to the memory. The exposure units include a first exposure unit associated with a first scan region and a second exposure unit associated with a second scan region. The processing device is to initiate a digital lithography process to pattern a substrate disposed on a stage in accordance with instructions. The processing device…
Multi-layer EPI chamber body
Granted: January 7, 2025
Patent Number:
12188148
An apparatus as disclosed herein relates to a chamber body design for use within a thermal deposition chamber, such as an epitaxial deposition chamber. The chamber body is a segmented chamber body design and includes an inject ring and a base plate. The base plate includes a substrate transfer passage and one or more exhaust passages disposed therethrough. The inject ring includes a plurality of gas inject passages disposed therethrough. The inject ring is disposed on top of the base…
Wafer immersion in semiconductor processing chambers
Granted: January 7, 2025
Patent Number:
12188144
A semiconductor processing chamber may process wafers by submerging the wafers in a liquid. To determine when the liquid is free of disturbances or contaminants and thus ready to receive the next wafer, a camera may be positioned to capture images of the liquid after a wafer has been removed from the liquid. A controller may provide the images of the liquid to a neural network to determine when the liquid is ready based on an output of the neural network. The neural network may be…
Liquid dispersion of quantum dots in an acrylic monomer medium
Granted: January 7, 2025
Patent Number:
12187935
Liquid dispersions of quantum dot particles comprise an acrylic medium and quantum dot particles dispersed in the acrylic medium have an initial viscosity. The quantum particles comprise ligands attached to the quantum dot particles, the ligands comprising functional groups configured to stabilize the initial viscosity liquid dispersion of the quantum dot particles. The liquid dispersions of quantum dot particles are useful as stable liquid formulations that resist gelling for…
