Applied Materials Patent Grants

Dynamic processing chamber baffle

Granted: October 15, 2024
Patent Number: 12119209
Exemplary methods of semiconductor processing may include delivering a deposition precursor into a processing region of a semiconductor processing chamber. The methods may include depositing a layer of material on a substrate housed in the processing region of the semiconductor processing chamber. The processing region may be maintained at a first pressure during the deposition. The methods may include extending a baffle within the processing region. The baffle may modify a flow path…

Movable bracket interlocking mating connectors with switch activation

Granted: October 15, 2024
Patent Number: 12119198
In embodiments, systems and apparatus comprise a bracket having a through hole configured to receive a first connector connected to a panel spaced from the bracket, the bracket movable between first and second positions; a switch mountable on the panel, the switch having first and second switch positions; and at least one compression spring extending from the bracket to bias the bracket into the first position spaced away from the switch. When the bracket is in the first position, the…

Magnetic levitation system, base and carrier of a magnetic levitation system, and method of levitating a carrier

Granted: October 15, 2024
Patent Number: 12119173
A magnetic levitation system for transporting a carrier is described. The magnetic levitation system includes a base defining a transportation track, a carrier movable relative to the base along the transportation track, and a plurality of active magnetic bearings provided at the base and configured to face a guided structure of the carrier. The guided structure includes a first guided zone and a second guided zone configured to interact with the plurality of active magnetic bearings and…

Image stabilization for digital lithography

Granted: October 15, 2024
Patent Number: 12117732
The present disclosure provides methods and systems for correcting the shooting of images from a spatial light modulator (SLM) to a substrate, when cross-scan vibrations, including sub-pixel cross-scan vibrations, are present. The methods and systems include shifting a mask pattern on an SLM rotated relative to the in-scan direction of travel on a substrate, shifting along an axis of the SLM to correct for cross-scan vibrations, and either delaying, or accelerating, the shooting of the…

Fabrication of optical devices utilizing dicing to maximize chamber space

Granted: October 15, 2024
Patent Number: 12117629
Embodiments of the present disclosure generally relate to optical device fabrication. In particular, embodiments described herein relate to a method of forming a plurality of optical devices. In one embodiment, a method includes dicing a plurality of optical device lenses from a substrate, disposing the plurality of optical device lenses on a carrier, and performing at least one process on the plurality of optical device lenses to form a plurality of optical devices, each optical device…

Parameter adjustment model for semiconductor processing chambers

Granted: October 15, 2024
Patent Number: 12116686
A system may include a first semiconductor processing station configured to deposit a material on a first semiconductor wafer, a second semiconductor processing station configured perform measurements indicative of a thickness of the material after the material has been deposited on the first semiconductor wafer, and a controller. The controller may be configured to receive the measurements from the second station; provide an input based on the measurements to a trained model that is…

Arene molybdenum (0) precursors for deposition of molybdenum films

Granted: October 15, 2024
Patent Number: 12116376
Molybdenum(0) coordination complexes comprising an arene ligand and one or more neutral ligands which coordinate to the metal center by carbon, nitrogen or phosphorous are described. Methods for depositing molybdenum-containing films on a substrate are described. The substrate is exposed to a molybdenum precursor and a reactant to form the molybdenum-containing film (e.g., elemental molybdenum, molybdenum oxide, molybdenum carbide, molybdenum silicide, molybdenum nitride). The exposures…

Calibration of an electronics processing system

Granted: October 15, 2024
Patent Number: 12115683
A first robot arm places a calibration object into a load lock that separates a factory interface from a transfer chamber using a first taught position. A second robot arm retrieves the calibration object from the load lock using a second taught position. A controller determines, using a sensor, a first offset amount between a calibration object center of the calibration object and a pocket center of the second robot arm. The controller determines a characteristic error value that…

Methods of greytone imprint lithography to fabricate optical devices

Granted: October 8, 2024
Patent Number: 12111572
A method of imprinting a pattern on a substrate is provided. The method includes forming a first pattern on a plurality of masters using a method other than imprinting, the first pattern including a plurality of patterned features of varying sizes; measuring the patterned features at a plurality of locations on each of the masters; selecting a first master of the plurality of masters based on the measurements of the patterned features on each of the masters; using the first master to…

Smart camera substrate

Granted: October 8, 2024
Patent Number: 12114083
Embodiments disclosed herein include a diagnostic substrate, comprising a baseplate, and a first plurality of image sensors on the baseplate, where the first plurality of image sensors are oriented horizontal to the baseplate. In an embodiment, the diagnostic substrate further comprises a second plurality of image sensors on the baseplate, where the second plurality of image sensors are oriented at a non-orthogonal angle to the baseplate. In an embodiment, the diagnostic substrate…

Portion of a display panel with a graphical user interface

Granted: October 8, 2024
Patent Number: D1045923

In-situ electric field detection method and apparatus

Granted: October 8, 2024
Patent Number: 12111341
Embodiments of the disclosure include an electric field measurement system that includes a first light source, a first light sensor configured to receive electromagnetic energy transmitted from the first light source, an electro-optic sensor, and a controller. The electro-optic sensor may include a package comprising a first electro-optic crystal disposed within a body; and at least one optical fiber. The optical fiber is configured to transmit electromagnetic energy transmitted from the…

Heat exchanger with multistaged cooling

Granted: October 8, 2024
Patent Number: 12111110
A heat exchanger for abating compounds produced in semiconductor processes is presented. When hot effluent flows into the heat exchanger, a coolant can be flowed to walls of a fluid heat exchanging surface within the heat exchanger. The heat exchanging surface can include a plurality of channel regions which creates a multi stage cross flow path for the hot effluent to flow down the heat exchanger. This flow path forces the hot effluent to hit the cold walls of the fluid heat exchanging…

Faceplate having a curved surface

Granted: October 8, 2024
Patent Number: 12110590
A faceplate for a substrate process chamber comprises a first and second surface. The second surface is shaped such that the second surface includes a peak and a distance between the first and second surface varies across the width of the faceplate. The second surface of the faceplate is exposed to a processing volume of the process chamber. Further, the faceplate may be part of a lid assembly for the process chamber. The lid assembly may include a blocker plate facing the first surface…

Methods for metal oxide post-treatment

Granted: October 8, 2024
Patent Number: 12110589
Methods comprising forming a metal oxide film by atomic layer deposition using water as an oxidant are described. The metal oxide film is exposed to a decoupled plasma comprising one or more of He, H2 or O2 to lower the wetch etch rate of the metal oxide film.

Process chamber and exhaust liner system therefor

Granted: October 8, 2024
Patent Number: 12110585
Embodiments of exhaust liner systems are provided herein. In some embodiments, an exhaust liner system for use in a process chamber includes a lower exhaust liner having an annular body with a central opening; an upper flange, a central flange, and a lower flange extending outward from the annular body, wherein the lower flange and the central flange partially define a first plenum, and wherein the central flange and the upper flange partially define a second plenum; a plurality of…

Low temperature growth of transition metal chalcogenides

Granted: October 8, 2024
Patent Number: 12110584
Transition metal dichalcogenide films and methods for depositing transition metal dichalcogenide films on a substrate are described. Methods for converting transition metal oxide films to transition metal dichalcogenide films are also described. The substrate is exposed to a precursor and a chalcogenide reactant to form the transition metal dichalcogenide film. The exposures can be sequential or simultaneous.

Interfacial layer for optical film performance

Granted: October 8, 2024
Patent Number: 12110582
A method of forming an optical device is provided. The method includes disposing an optical device substrate on a substrate support in a process volume of a process chamber, the optical device substrate having a first surface; and forming a first optical layer on the first surface of the optical device substrate during a first time period when the optical device substrate is on the substrate support, wherein the first optical layer comprises one or more metals in a metal-containing…

Optical device having structural and refractive index gradation, and method of fabricating the same

Granted: October 8, 2024
Patent Number: 12109641
The present disclosure generally relates to a method and apparatus for forming a substrate having a graduated refractive index. A method of forming a waveguide structure includes expelling plasma from an applicator having a head toward a plurality of grating structures formed on a substrate. The plasma is formed in the head at atmospheric pressure. The method further includes changing a depth of the plurality of grating structures with the plasma by removing grating material from the…

Portion of a display panel with a graphical user interface

Granted: October 8, 2024
Patent Number: D1045924