Prediction of electrical properties of a semiconductor specimen
Granted: March 11, 2025
Patent Number:
12250503
There is provided a method and a system configured to obtain metrology data Dmetrology informative of a plurality of structural parameters of a semiconductor specimen, obtain a model informative of a relationship between at least some of said structural parameters and one or more electrical properties of the specimen, use the model and Dmetrology to determine, for at least one given electrical property of the specimen, one or more given structural parameters among the plurality of…
Arsenic diffusion profile engineering for transistors
Granted: March 11, 2025
Patent Number:
12249626
Embodiments of the present disclosure relate to methods for forming a source/drain extension. In one embodiment, a method for forming an nMOS device includes forming a gate electrode and a gate spacer over a first portion of a semiconductor fin, removing a second portion of the semiconductor fin to expose a side wall and a bottom, forming a silicon arsenide (Si:As) layer on the side wall and the bottom, and forming a source/drain region on the Si:As layer. During the deposition of the…
Methods for increasing the density of high-index nanoimprint lithography films
Granted: March 4, 2025
Patent Number:
12242186
Embodiments of the present disclosure generally relate to densified nanoimprint films and processes for making these densified nanoimprint films, as well as optical devices containing the densified nanoimprint films. In one or more embodiments, a densified nanoimprint film contains a base nanoimprint film and a metal oxide disposed on the base nanoimprint film and in between the nanoparticles. The base nanoimprint film contains nanoparticles, where the nanoparticles contain titanium…
Conformal oxidation for gate all around nanosheet I/O device
Granted: March 4, 2025
Patent Number:
12243941
Horizontal gate-all-around devices and methods of manufacturing the same are described. The hGAA devices comprise an oxidize layer on a semiconductor material between source regions and drain regions of the device. The method includes radical plasma oxidation (RPO) of semiconductor material layers between source regions and drain regions of an electronic device.
Micro-LED displays to reduce subpixel crosstalk
Granted: March 4, 2025
Patent Number:
12243864
A display screen includes a backplane, an array of light-emitting diodes electrically integrated with the backplane, the array of light-emitting diodes configured to emit UV light in a first wavelength range, and a plurality of isolation walls formed on the backplane between adjacent light-emitting diodes of the array of light-emitting diodes with the isolation walls spaced apart from the light-emitting diodes and extending above the light-emitting diodes. The plurality of isolation…
Impurity removal in doped ALD tantalum nitride
Granted: March 4, 2025
Patent Number:
12243774
Methods of forming copper interconnects are described. A doped tantalum nitride layer formed on a copper layer on a substrate has a first amount of dopant. The doped tantalum nitride layer is exposed to a plasma comprising one or more of helium or neon to form a treated doped tantalum nitride layer with a decreased amount of dopant. Apparatus for performing the methods are also described.
Detection and analysis of substrate support and pre-heat ring in a process chamber via imaging
Granted: March 4, 2025
Patent Number:
12243761
An apparatus, method, and system for identifying and obtaining information related to a substrate support and/or a pre-heat ring in a process chamber via imaging and image processing. In an embodiment, a substrate support is provided. The substrate support generally includes a top surface configured to receive a substrate in a process chamber and a marking feature disposed on the top surface of the substrate support, the marking feature configured to be detectable by an imaging apparatus…
Temperature controlled substrate support assembly
Granted: March 4, 2025
Patent Number:
12243756
Implementations described herein provide a substrate support assembly which enables both lateral and azimuthal tuning of the heat transfer between an electrostatic chuck and a heater assembly. The substrate support assembly comprises an upper surface and a lower surface; one or more main resistive heaters disposed in the substrate support; and a plurality of heaters in column with the main resistive heaters and disposed in the substrate support. A quantity of the heaters is an order of…
Overlaying on locally dispositioned patterns by ML based dynamic digital corrections (ML-DDC)
Granted: March 4, 2025
Patent Number:
12242789
Systems and methods disclosed are generally related to masklessly developing connections between a chip-group and a design connection point on a substrate. In placement of the chip-group on the substrate, according to certain embodiments the chip-group may be dispositioned relative to an expected position per a substrate layout design, causing a connection misalignment with the design connection point. According to certain embodiments, a machine learning (ML) model is trained on…
Methods and mechanisms for generating a data collection plan for a semiconductor manufacturing system
Granted: March 4, 2025
Patent Number:
12242237
A method includes initiating a connection with a semiconductor manufacturing system. The method further includes generating a set of tool data items associated with the semiconductor manufacturing system. The method further includes providing a graphical user interface (GUI) presenting the set of tool data items associated with the semiconductor manufacturing system and receiving and via the GUI, user input selecting one or more of the tool data items. The method further includes adding…
Constant headspace ampoule
Granted: March 4, 2025
Patent Number:
12241594
Ampoules including a housing, a lid and a floating structure are described. The floating structure includes a float with a volume determined to displace a predetermined volume of liquid within the ampoule. An outlet channel extends from the top surface of the float. A baffle is positioned along the length of the outlet channel and creates a saturation zone between the baffle and the float.
Cleaning system for polishing liquid delivery arm
Granted: March 4, 2025
Patent Number:
12240078
A polishing assembly includes a rotatable platen to support a polishing pad, a polishing liquid delivery arm having an enclosure open at a bottom thereof and one or more ports to deliver a polishing liquid and a cleaning fluid downwardly through an interior space of the enclosure onto the polishing pad, and a delivery arm cleaning tool removably attached to the polishing liquid delivery arm, the cleaning tool extending below the delivery arm and having a delivery arm-facing surface…
Vapor phase coating technology for pharmaceutical abuse deterrent formulations
Granted: February 25, 2025
Patent Number:
12233169
A method of preparing an abuse deterrent pharmaceutical composition having a drug-containing core enclosed by one or more metal oxide materials is provided. The method includes the sequential steps of (a) loading the particles comprising the drug into a reactor, (b) applying a vaporous or gaseous metal precursor to the particles in the reactor, (c) performing one or more pump-purge cycles of the reactor using inert gas, (d) applying a vaporous or gaseous oxidant to the particles in the…
On-board cleaning of tooling parts in hybrid bonding tool
Granted: February 25, 2025
Patent Number:
12237186
Methods and apparatus for cleaning tooling parts in a substrate processing tool are provided herein. In some embodiments, a method of cleaning tooling parts in a substrate processing tool includes placing one or more dirty tools on a holder in a bonding chamber of a multi-chamber processing tool; transferring the holder from the bonding chamber to a cleaning chamber of the multi-chamber processing tool; cleaning the one or more dirty tools in the cleaning chamber to produce one or more…
Methods and mechanisms for generating virtual knobs for model performance tuning
Granted: February 25, 2025
Patent Number:
12236077
An electronic device manufacturing system configured to receive, by a processor, input data reflecting a feature related to a manufacturing process of a substrate. The manufacturing system is further configured to train a machine-learning model based on the input data reflecting the feature. The manufacturing system is further configured to modify the machine-learning model in view of the virtual knob for the feature.
Methods and mechanisms for adjusting process chamber parameters during substrate manufacturing
Granted: February 25, 2025
Patent Number:
12235624
An electronic device manufacturing system capable of obtaining metrology data generated using metrology equipment located within a process chamber that performs a deposition process on a substrate according to a process recipe, wherein the process recipe comprises a plurality of setting parameters, and wherein the deposition process generates a plurality of film layers on a surface of the substrate. The manufacturing system can further generate a correction profile based on the metrology…
Micro-electromechanical device for use in a flow control apparatus
Granted: February 25, 2025
Patent Number:
12235144
Disclosed herein are embodiments of a sensor device, systems incorporating the same, and methods of fabricating the same. In one embodiment, a sensor device comprises a free-standing sensing element, such as a micro-electromechanical system (MEMS) device. The sensor device further comprises a metallic band to facilitate mounting the MEMS device to a mounting plate. The sensor device further comprises a conformal coating on a least a portion of a sensor region of the sensor device.
Method of in situ ceramic coating deposition
Granted: February 25, 2025
Patent Number:
12234549
Methods for in situ seasoning of process chamber components, such as electrodes are described. In an embodiment, the method includes depositing a silicon oxide film over the process chamber component and converting the silicon oxide film to a silicon-carbon-containing film. The silicon-carbon-containing film forms a protective film over the process chamber components and is resistant to plasma processing and/or dry etch cleaning. The coatings has high density, good emissivity control,…
Polishing system with capacitive shear sensor
Granted: February 25, 2025
Patent Number:
12233505
A polishing pad includes a sensor assembly surrounded by a lower portion of the polishing pad, and an upper portion including a pad portion disposed on the assembly and at least a portion of a polishing layer disposed on the lower portion. The sensor assembly includes a lower body having a first pair of electrodes formed thereon, a polymer body having a second pair of electrodes formed thereon and aligned with the first pair of electrodes, and a pair of gaps between the first pair of…
Ultraviolet and ozone cleaning apparatus and method of using
Granted: February 25, 2025
Patent Number:
12233441
A cleaning apparatus for cleaning a substrate wherein the substrate is contacted with ozonated water and irradiating the substrate and the ozonated water with UV electromagnetic radiation from a UV lamp within a cleaning chamber; wherein greater than or equal to about 50% of the UV electromagnetic radiation has a wavelength of greater than or equal to about 280 nm. Methods of cleaning a substrate are also presented.
